P

Inventor

CANAPERI DONALD F

US50 patents
⚠️ This page may combine multiple inventors who share the name “CANAPERI DONALD F”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

47 patents
US7045453B2May 16, 2006

Very low effective dielectric constant interconnect structures and methods for fabricating the same

IBM221 citations99
US7023093B2Apr 4, 2006

Very low effective dielectric constant interconnect Structures and methods for fabricating the same

IBM112 citations98
US6621392B1Sep 16, 2003

Micro electromechanical switch having self-aligned spacers

IBM211 citations98
US6524935B1Feb 25, 2003

Preparation of strained Si/SiGe on insulator by hydrogen induced layer transfer technique

IBM250 citations98
US6348076B1Feb 19, 2002

Slurry for mechanical polishing (CMP) of metals and use thereof

IBM147 citations98
US6475072B1Nov 5, 2002

Method of wafer smoothing for bonding using chemo-mechanical polishing (CMP)

IBM86 citations97
US5635253AJun 3, 1997

Method of replenishing electroless gold plating baths

IBM56 citations96
US10553522B1Feb 4, 2020

Semiconductor microcooler

IBM20 citations94
US10395986B1Aug 27, 2019

Fully aligned via employing selective metal deposition

IBM24 citations94
US9754798B1Sep 5, 2017

Hybridization fin reveal for uniform fin reveal depth across different fin pitches

IBM17 citations92
US5516416AMay 14, 1996

Apparatus and method for electroplating pin grid array packaging modules

IBM30 citations91
US5576099ANov 19, 1996

Inductive head lamination with layer of magnetic quenching material

IBM21 citations90
US6361402B1Mar 26, 2002

Method for planarizing photoresist

IBM26 citations89
US10553516B1Feb 4, 2020

Semiconductor microcooler

IBM10 citations84
US10468585B1Nov 5, 2019

Dual function magnetic tunnel junction pillar encapsulation

IBM7 citations84
US9679780B1Jun 13, 2017

Polysilicon residue removal in nanosheet MOSFETs

IBM11 citations84
US9312224B1Apr 12, 2016

Interconnect structure containing a porous low k interconnect dielectric/dielectric cap

IBM9 citations84
US9209017B2Dec 8, 2015

Advanced ultra low k SiCOH dielectrics prepared by built-in engineered pore size and bonding structured with cyclic organosilicon precursors

IBM5 citations84
US10937789B2Mar 2, 2021

Nanosheet eDRAM

IBM4 citations73
US10366928B2Jul 30, 2019

Hybridization fin reveal for uniform fin reveal depth across different fin pitches

IBM1 citations73
US9711456B2Jul 18, 2017

Composite manganese nitride/low-K dielectric cap

IBM2 citations73
US9087796B2Jul 21, 2015

Semiconductor fabrication method using stop layer

IBM4 citations73
US7407605B2Aug 5, 2008

Manufacturable CoWP metal cap process for copper interconnects

IBM8 citations73
US6762667B2Jul 13, 2004

Micro electromechanical switch having self-aligned spacers

IBM10 citations73
US10832917B2Nov 10, 2020

Low oxygen cleaning for CMP equipment

IBM3 citations68
US10971675B2Apr 6, 2021

Dual function magnetic tunnel junction pillar encapsulation

IBM0 citations63
US10224283B2Mar 5, 2019

Composite manganese nitride / low-k dielectric cap

IBM1 citations63
US11056418B2Jul 6, 2021

Semiconductor microcooler

IBM0 citations62
US11049789B2Jun 29, 2021

Semiconductor microcooler

IBM0 citations62
US11031250B2Jun 8, 2021

Semiconductor structures of more uniform thickness

IBM1 citations62
US10242882B2Mar 26, 2019

Cyclic etch process to remove dummy gate oxide layer for fin field effect transistor fabrication

IBM1 citations62
US7199450B2Apr 3, 2007

Materials and method to seal vias in silicon substrates

IBM2 citations62
US4910049AMar 20, 1990

Conditioning a dielectric substrate for plating thereon

IBM4 citations61
US11756786B2Sep 12, 2023

Forming high carbon content flowable dielectric film with low processing damage

IBM0 citations60
US10242872B2Mar 26, 2019

Rework of patterned dielectric and metal hardmask films

IBM0 citations52
US10163721B2Dec 25, 2018

Hybridization fin reveal for uniform fin reveal depth across different fin pitches

IBM0 citations52
US9997352B2Jun 12, 2018

Polysilicon residue removal in nanosheet MOSFETs

IBM1 citations52
US9947622B2Apr 17, 2018

Ultrathin superlattice of MnO/Mn/MnN and other metal oxide/metal/metal nitride liners and caps for copper low dielectric constant interconnects

IBM0 citations52
US9935015B1Apr 3, 2018

Hybridization fin reveal for uniform fin reveal depth across different fin pitches

IBM0 citations52
US9691705B2Jun 27, 2017

Ultrathin superlattice of MnO/Mn/MnN and other metal oxide/metal/metal nitride liners and caps for copper low dielectric constant interconnects

IBM0 citations52
US9472503B2Oct 18, 2016

Ultrathin superlattice of MnO/Mn/MnN and other metal oxide/metal/metal nitride liners and caps for copper low dielectric constant interconnects

IBM0 citations52
US9449810B2Sep 20, 2016

Advanced ultra low k SiCOH dielectrics prepared by built-in engineered pore size and bonding structured with cyclic organosilicon precursors

IBM0 citations52
US9275952B2Mar 1, 2016

Ultrathin superlattice of MnO/Mn/MnN and other metal oxide/metal/metal nitride liners and caps for copper low dielectric constant interconnects

IBM0 citations52
US9214332B2Dec 15, 2015

Composite dielectric materials with improved mechanical and electrical properties

IBM0 citations52
US7253106B2Aug 7, 2007

Manufacturable CoWP metal cap process for copper interconnects

IBM1 citations51
US11804378B2Oct 31, 2023

Surface conversion in chemical mechanical polishing

IBM0 citations49
US8815475B2Aug 26, 2014

Reticle carrier

IBM0 citations49

PETRARCA KEVIN S

2 patents

GLOBALFOUNDRIES INC

1 patent