Inventor
CANAPERI DONALD F
US50 patents
⚠️ This page may combine multiple inventors who share the name “CANAPERI DONALD F”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
47 patentsUS7045453B2May 16, 2006
Very low effective dielectric constant interconnect structures and methods for fabricating the same
IBM221 citations99
US7023093B2Apr 4, 2006
Very low effective dielectric constant interconnect Structures and methods for fabricating the same
IBM112 citations98
US6621392B1Sep 16, 2003
Micro electromechanical switch having self-aligned spacers
IBM211 citations98
US6524935B1Feb 25, 2003
Preparation of strained Si/SiGe on insulator by hydrogen induced layer transfer technique
IBM250 citations98
US6348076B1Feb 19, 2002
Slurry for mechanical polishing (CMP) of metals and use thereof
IBM147 citations98
US6475072B1Nov 5, 2002
Method of wafer smoothing for bonding using chemo-mechanical polishing (CMP)
IBM86 citations97
US5635253AJun 3, 1997
Method of replenishing electroless gold plating baths
IBM56 citations96
US10553522B1Feb 4, 2020
Semiconductor microcooler
IBM20 citations94
US10395986B1Aug 27, 2019
Fully aligned via employing selective metal deposition
IBM24 citations94
US9754798B1Sep 5, 2017
Hybridization fin reveal for uniform fin reveal depth across different fin pitches
IBM17 citations92
US5516416AMay 14, 1996
Apparatus and method for electroplating pin grid array packaging modules
IBM30 citations91
US5576099ANov 19, 1996
Inductive head lamination with layer of magnetic quenching material
IBM21 citations90
US6361402B1Mar 26, 2002
Method for planarizing photoresist
IBM26 citations89
US10553516B1Feb 4, 2020
Semiconductor microcooler
IBM10 citations84
US10468585B1Nov 5, 2019
Dual function magnetic tunnel junction pillar encapsulation
IBM7 citations84
US9679780B1Jun 13, 2017
Polysilicon residue removal in nanosheet MOSFETs
IBM11 citations84
US9312224B1Apr 12, 2016
Interconnect structure containing a porous low k interconnect dielectric/dielectric cap
IBM9 citations84
US9209017B2Dec 8, 2015
Advanced ultra low k SiCOH dielectrics prepared by built-in engineered pore size and bonding structured with cyclic organosilicon precursors
IBM5 citations84
US10937789B2Mar 2, 2021
Nanosheet eDRAM
IBM4 citations73
US10366928B2Jul 30, 2019
Hybridization fin reveal for uniform fin reveal depth across different fin pitches
IBM1 citations73
US9711456B2Jul 18, 2017
Composite manganese nitride/low-K dielectric cap
IBM2 citations73
US9087796B2Jul 21, 2015
Semiconductor fabrication method using stop layer
IBM4 citations73
US7407605B2Aug 5, 2008
Manufacturable CoWP metal cap process for copper interconnects
IBM8 citations73
US6762667B2Jul 13, 2004
Micro electromechanical switch having self-aligned spacers
IBM10 citations73
US10832917B2Nov 10, 2020
Low oxygen cleaning for CMP equipment
IBM3 citations68
US10971675B2Apr 6, 2021
Dual function magnetic tunnel junction pillar encapsulation
IBM0 citations63
US10224283B2Mar 5, 2019
Composite manganese nitride / low-k dielectric cap
IBM1 citations63
US11056418B2Jul 6, 2021
Semiconductor microcooler
IBM0 citations62
US11049789B2Jun 29, 2021
Semiconductor microcooler
IBM0 citations62
US11031250B2Jun 8, 2021
Semiconductor structures of more uniform thickness
IBM1 citations62
US10242882B2Mar 26, 2019
Cyclic etch process to remove dummy gate oxide layer for fin field effect transistor fabrication
IBM1 citations62
US7199450B2Apr 3, 2007
Materials and method to seal vias in silicon substrates
IBM2 citations62
US4910049AMar 20, 1990
Conditioning a dielectric substrate for plating thereon
IBM4 citations61
US11756786B2Sep 12, 2023
Forming high carbon content flowable dielectric film with low processing damage
IBM0 citations60
US10242872B2Mar 26, 2019
Rework of patterned dielectric and metal hardmask films
IBM0 citations52
US10163721B2Dec 25, 2018
Hybridization fin reveal for uniform fin reveal depth across different fin pitches
IBM0 citations52
US9997352B2Jun 12, 2018
Polysilicon residue removal in nanosheet MOSFETs
IBM1 citations52
US9947622B2Apr 17, 2018
Ultrathin superlattice of MnO/Mn/MnN and other metal oxide/metal/metal nitride liners and caps for copper low dielectric constant interconnects
IBM0 citations52
US9935015B1Apr 3, 2018
Hybridization fin reveal for uniform fin reveal depth across different fin pitches
IBM0 citations52
US9691705B2Jun 27, 2017
Ultrathin superlattice of MnO/Mn/MnN and other metal oxide/metal/metal nitride liners and caps for copper low dielectric constant interconnects
IBM0 citations52
US9472503B2Oct 18, 2016
Ultrathin superlattice of MnO/Mn/MnN and other metal oxide/metal/metal nitride liners and caps for copper low dielectric constant interconnects
IBM0 citations52
US9449810B2Sep 20, 2016
Advanced ultra low k SiCOH dielectrics prepared by built-in engineered pore size and bonding structured with cyclic organosilicon precursors
IBM0 citations52
US9275952B2Mar 1, 2016
Ultrathin superlattice of MnO/Mn/MnN and other metal oxide/metal/metal nitride liners and caps for copper low dielectric constant interconnects
IBM0 citations52
US9214332B2Dec 15, 2015
Composite dielectric materials with improved mechanical and electrical properties
IBM0 citations52
US7253106B2Aug 7, 2007
Manufacturable CoWP metal cap process for copper interconnects
IBM1 citations51
US11804378B2Oct 31, 2023
Surface conversion in chemical mechanical polishing
IBM0 citations49
US8815475B2Aug 26, 2014
Reticle carrier
IBM0 citations49