Inventor
JAGANNATHAN RANGARAJAN
US27 patents
⚠️ This page may combine multiple inventors who share the name “JAGANNATHAN RANGARAJAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
23 patentsUS7859013B2Dec 28, 2010
Metal oxide field effect transistor with a sharp halo
IBM100 citations98
US7595010B2Sep 29, 2009
Method for producing a doped nitride film, doped oxide film and other doped films
IBM57 citations97
US7361611B2Apr 22, 2008
Doped nitride film, doped oxide film and other doped films
IBM55 citations97
US6200891B1Mar 13, 2001
Removal of dielectric oxides
IBM54 citations96
US5635253AJun 3, 1997
Method of replenishing electroless gold plating baths
IBM56 citations96
US6254796B1Jul 3, 2001
Selective etching of silicate
IBM24 citations92
US6191085B1Feb 20, 2001
Method for cleaning semiconductor devices
IBM17 citations92
US6150282ANov 21, 2000
Selective removal of etching residues
IBM25 citations92
US6117796ASep 12, 2000
Removal of silicon oxide
IBM23 citations92
US6066267AMay 23, 2000
Etching of silicon nitride
IBM24 citations92
US6033996AMar 7, 2000
Process for removing etching residues, etching mask and silicon nitride and/or silicon dioxide
IBM48 citations92
US5965465AOct 12, 1999
Etching of silicon nitride
IBM28 citations92
US5962384AOct 5, 1999
Method for cleaning semiconductor devices
IBM40 citations92
US6114249ASep 5, 2000
Chemical mechanical polishing of multiple material substrates and slurry having improved selectivity
IBM42 citations90
US5304284AApr 19, 1994
Methods for etching a less reactive material in the presence of a more reactive material
IBM22 citations90
US6361402B1Mar 26, 2002
Method for planarizing photoresist
IBM26 citations89
US5780363AJul 14, 1998
Etching composition and use thereof
IBM43 citations85
US7435652B1Oct 14, 2008
Integration schemes for fabricating polysilicon gate MOSFET and high-K dielectric metal gate MOSFET
IBM11 citations84
US5102456AApr 7, 1992
Tetra aza ligand systems as complexing agents for electroless deposition of copper
IBM21 citations81
US4818286AApr 4, 1989
Electroless copper plating bath
IBM11 citations72
US5935869AAug 10, 1999
Method of planarizing semiconductor wafers
IBM14 citations66
US7384835B2Jun 10, 2008
Metal oxide field effect transistor with a sharp halo and a method of forming the transistor
IBM3 citations63
US5059243AOct 22, 1991
Tetra aza ligand systems as complexing agents for electroless deposition of copper
IBM6 citations61