Inventor
ADACHI TEPPEI
JP22 patents
Patents
22 patentsUS9091918B2Jul 28, 2015
Sulfonium salt, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO58 citations98
US10012902B2Jul 3, 2018
Positive resist composition and pattern forming process
SHINETSU CHEMICAL CO7 citations84
US9846360B2Dec 19, 2017
Resist composition and patterning process
SHINETSU CHEMICAL CO10 citations84
US9360760B2Jun 7, 2016
Pattern forming process and shrink agent
SHINETSU CHEMICAL CO10 citations84
US11693314B2Jul 4, 2023
Resist composition and patterning process
SHINETSU CHEMICAL CO4 citations74
US11262653B2Mar 1, 2022
Sulfonium salt, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO3 citations73
US11009793B2May 18, 2021
Monomer, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO4 citations73
US10023674B2Jul 17, 2018
Monomer, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO3 citations73
US9904169B2Feb 27, 2018
Photomask blank, resist pattern forming process, and method for making photomask
SHINETSU CHEMICAL CO5 citations73
US9760010B2Sep 12, 2017
Patterning process
SHINETSU CHEMICAL CO2 citations73
US9429846B2Aug 30, 2016
Pattern forming process and shrink agent
SHINETSU CHEMICAL CO6 citations73
US11340527B2May 24, 2022
Resist composition and patterning process
SHINETSU CHEMICAL CO3 citations72
US12072627B2Aug 27, 2024
Resist composition and patterning process
SHINETSU CHEMICAL CO0 citations62
US12050402B2Jul 30, 2024
Resist composition and patterning process
SHINETSU CHEMICAL CO2 citations62
US10921710B2Feb 16, 2021
Resist composition and pattern forming process
SHINETSU CHEMICAL CO0 citations52
US9829792B2Nov 28, 2017
Monomer, polymer, positive resist composition, and patterning process
SHINETSU CHEMICAL CO0 citations52
US9146464B2Sep 29, 2015
Sulfonium salt, polymer, polymer making method, resist composition, and patterning process
SHINETSU CHEMICAL CO0 citations52
US11662663B2May 30, 2023
Substrate protective film-forming composition and pattern forming process
SHINETSU CHEMICAL CO0 citations51
US10191373B2Jan 29, 2019
Method for producing polymer
SHINETSU CHEMICAL CO0 citations51
US10310376B2Jun 4, 2019
Resist composition, pattern forming process, polymer, and monomer
SHINETSU CHEMICAL CO0 citations42
US9017931B2Apr 28, 2015
Patterning process and resist composition
SHINETSU CHEMICAL CO0 citations42
US10457761B2Oct 29, 2019
Polymer, resist composition, and pattern forming process
SHINETSU CHEMICAL CO0 citations41