P

Inventor

ZHANG JINGYUN

US193 patents
⚠️ This page may combine multiple inventors who share the name “ZHANG JINGYUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

42 patents
US10700064B1Jun 30, 2020

Multi-threshold voltage gate-all-around field-effect transistor devices with common gates

IBM89 citations98
US10236217B1Mar 19, 2019

Stacked field-effect transistors (FETs) with shared and non-shared gates

IBM50 citations98
US10825736B1Nov 3, 2020

Nanosheet with selective dipole diffusion into high-k

IBM44 citations95
US10763177B1Sep 1, 2020

I/O device for gate-all-around transistors

IBM40 citations95
US11075273B1Jul 27, 2021

Nanosheet electrostatic discharge structure

IBM20 citations94
US10734286B1Aug 4, 2020

Multiple dielectrics for gate-all-around transistors

IBM32 citations94
US10553696B2Feb 4, 2020

Full air-gap spacers for gate-all-around nanosheet field effect transistors

IBM21 citations94
US10381438B2Aug 13, 2019

Vertically stacked NFETS and PFETS with gate-all-around structure

IBM25 citations94
US10319846B1Jun 11, 2019

Multiple work function nanosheet field-effect transistors with differential interfacial layer thickness

IBM28 citations94
US11152510B2Oct 19, 2021

Long channel optimization for gate-all-around transistors

IBM10 citations86
US10734447B2Aug 4, 2020

Field-effect transistor unit cells for neural networks with differential weights

IBM12 citations86
US10553678B2Feb 4, 2020

Vertically stacked dual channel nanosheet devices

IBM12 citations86
US10553679B2Feb 4, 2020

Formation of self-limited inner spacer for gate-all-around nanosheet FET

IBM14 citations86
US10332809B1Jun 25, 2019

Method and structure to introduce strain in stack nanosheet field effect transistor

IBM15 citations86
US10573723B1Feb 25, 2020

Vertical transport FETs with asymmetric channel profiles using dipole layers

IBM12 citations85
US11195911B2Dec 7, 2021

Bottom dielectric isolation structure for nanosheet containing devices

IBM8 citations84
US11164792B2Nov 2, 2021

Complementary field-effect transistors

IBM8 citations84
US11133309B2Sep 28, 2021

Multi-threshold voltage gate-all-around transistors

IBM6 citations84
US10886369B2Jan 5, 2021

Formation of self-limited inner spacer for gate-all-around nanosheet FET

IBM8 citations84
US10886368B2Jan 5, 2021

I/O device scheme for gate-all-around transistors

IBM7 citations84
US10879352B2Dec 29, 2020

Vertically stacked nFETs and pFETs with gate-all-around structure

IBM9 citations84
US10756216B2Aug 25, 2020

Nanosheet mosfet with isolated source/drain epitaxy and close junction proximity

IBM10 citations84
US10748994B2Aug 18, 2020

Vertically stacked nFET and pFET with dual work function

IBM7 citations84
US10741660B2Aug 11, 2020

Nanosheet single gate (SG) and extra gate (EG) field effect transistor (FET) co-integration

IBM9 citations84
US10707304B2Jul 7, 2020

Vertically stacked nFET and pFET with dual work function

IBM5 citations84
US10692866B2Jun 23, 2020

Co-integrated channel and gate formation scheme for nanosheet transistors having separately tuned threshold voltages

IBM7 citations84
US10658462B2May 19, 2020

Vertically stacked dual channel nanosheet devices

IBM6 citations84
US10643899B2May 5, 2020

Gate stack optimization for wide and narrow nanosheet transistor devices

IBM7 citations84
US10546925B2Jan 28, 2020

Vertically stacked nFET and pFET with dual work function

IBM10 citations84
US10529716B1Jan 7, 2020

Asymmetric threshold voltage VTFET with intrinsic dual channel epitaxy

IBM8 citations84
US10522419B2Dec 31, 2019

Stacked field-effect transistors (FETs) with shared and non-shared gates

IBM5 citations84
US10468532B1Nov 5, 2019

Nanosheet substrate isolation scheme by lattice matched wide bandgap semiconductor

IBM7 citations84
US10170577B1Jan 1, 2019

Vertical transport FETs having a gradient threshold voltage

IBM7 citations84
US10243060B2Mar 26, 2019

Uniform low-k inner spacer module in gate-all-around (GAA) transistors

IBM13 citations83
US9947767B1Apr 17, 2018

Self-limited inner spacer formation for gate-all-around field effect transistors

IBM7 citations83
US10079233B2Sep 18, 2018

Semiconductor device and method of forming the semiconductor device

IBM5 citations82
US11810828B2Nov 7, 2023

Transistor boundary protection using reversible crosslinking reflow

IBM2 citations73
US11756996B2Sep 12, 2023

Formation of wrap-around-contact for gate-all-around nanosheet FET

IBM2 citations73
US11710699B2Jul 25, 2023

Complementary FET (CFET) buried sidewall contact with spacer foot

IBM2 citations73
US11502169B2Nov 15, 2022

Nanosheet semiconductor devices with n/p boundary structure

IBM2 citations73
US11500614B2Nov 15, 2022

Stacked FET multiply and accumulate integrated circuit

IBM2 citations73
US11398480B2Jul 26, 2022

Transistor having forked nanosheets with wraparound contacts

IBM2 citations73

ZHANG JINGYUN

4 patents

CHEMIMAGE CORP

3 patents

COMMISSARIAT ENERGIE ATOMIQUE

1 patent

Showing the top 50 of 193 patents by PatentIndex Score.