Inventor

NISHIOKA TADASHI

JP36 patents

⚠️ This page may combine multiple inventors who share the name “NISHIOKA TADASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NISHIOKA TADASHI

MITSUBISHI ELECTRIC CORP

Method of using scanning probe microscope allowing cleaning of probe tip in ambient atmosphere

Method of forming fine patterns

Adhesion measuring method

Cantilever for atomic force microscope and method of manufacturing the cantilever

Fine scanning mechanism for atomic force microscope

Tunnel unit and scanning head for scanning tunneling microscope

Fine adjustment mechanism for a scanning tunneling microscope

Fine adjustment mechanism for a scanning tunneling microscope

Method of mounting a semiconductor element for analyzing failures thereon

Method of forming fine patterns

Method of forming fine patterns

Mask for transferring a pattern for use in a semiconductor device and method of manufacturing the same

Mask for transferring a pattern for use in a semiconductor device and method of manufacturing the same

Photoresist coating apparatus

Semiconductor wafer inspection apparatus

Cantilever for use in atomic force microscope and manufacturing method therefor

Process for forming electrodes for semiconductor devices using focused ion beam deposition

Process for forming electrodes for semiconductor devices using focused ion beams

Coarse adjusting device of scanning tunneling microscope

Apparatus for analyzing thin film property

Method for repairing a pattern

Aluminum circuit to be disconnected and method of cutting the same

Method of treating silicon nitride film formed by plasma deposition

Method for manufacturing a read only memory device using a focused ion beam to alter superconductivity

Read only memory device including a superconductive electrode

Atomic force microscope and measuring head thereof with linearly polarized reflected light

Sample stage for scanning probe microscope head

Process for forming electrodes for semiconductor devices by focused ion beam technology

Process for forming electrodes for semiconductor devices

Method for identifying a blistered film in layered films

Aluminum circuit to be disconnected and method of cutting the same

Contamination evaluating apparatus

SHARP KK

Liquid crystal display device, method of correcting defective pixels, and defective-pixel correcting apparatus used therein

Method for manufacturing display device

Display device

RYODEN SEMICONDUCTOR SYST ENG

Method of removing photosensitive resin and photosensitive resin removing apparatus