Inventor
KAWADA Yukihisa
JP11 patents
Patents
11 patentsUS11429018B2Aug 30, 2022
Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method
FUJIFILM CORP2 citations72
US12560861B2Feb 24, 2026
Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method
FUJIFILM CORP0 citations61
US12494400B2Dec 9, 2025
Method for inspecting chemical solution, method for producing chemical solution, method for controlling chemical solution, method for producing semiconductor device, method for inspecting resist composition, method for producing resist composition, method for controlling resist composition, and method for checking contamination status of semiconductor manufacturing apparatus
FUJIFILM CORP0 citations61
US12434997B2Oct 7, 2025
Chemical liquid storage body
FUJIFILM CORP0 citations60
US12311294B2May 27, 2025
Chemical liquid purification method and chemical liquid
FUJIFILM CORP0 citations60
US12210287B2Jan 28, 2025
Resist pattern forming method and semiconductor chip manufacturing method
FUJIFILM CORP0 citations60
US11976001B2May 7, 2024
Chemical liquid storage body
FUJIFILM CORP0 citations60
US11958005B2Apr 16, 2024
Chemical liquid purification method and chemical liquid
FUJIFILM CORP0 citations60
US11491428B2Nov 8, 2022
Chemical liquid purification method and chemical liquid
FUJIFILM CORP0 citations60
US11351503B2Jun 7, 2022
Chemical liquid purification method
FUJIFILM CORP0 citations60
US12253801B2Mar 18, 2025
Solution, solution storage body, actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of semiconductor device
FUJIFILM CORP0 citations51