Inventor
SWILLAM MOHAMED
US14 patents
⚠️ This page may combine multiple inventors who share the name “SWILLAM MOHAMED”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML HOLDING NV
9 patentsUS12306541B2May 20, 2025
Lithographic apparatus, metrology systems, illumination switches and methods thereof
ASML HOLDING NV2 citations72
US12124177B2Oct 22, 2024
Overlay measurement system using lock-in amplifier technique
ASML HOLDING NV2 citations72
US12140872B2Nov 12, 2024
Optical designs of miniaturized overlay measurement system
ASML HOLDING NV0 citations61
US12066762B2Aug 20, 2024
On chip sensor for wafer overlay measurement
ASML HOLDING NV1 citations61
US11994808B2May 28, 2024
Lithographic apparatus, metrology systems, phased array illumination sources and methods thereof
ASML HOLDING NV1 citations58
US12216414B2Feb 4, 2025
Self-referencing integrated alignment sensor
ASML HOLDING NV0 citations51
US12135505B2Nov 5, 2024
Spectrometric metrology systems based on multimode interference and lithographic apparatus
ASML HOLDING NV0 citations51
US12487081B2Dec 2, 2025
On chip wafer alignment sensor
ASML HOLDING NV0 citations49
US12399000B2Aug 26, 2025
Systems and methods for measuring intensity in a lithographic alignment apparatus
ASML HOLDING NV0 citations48
ASML NETHERLANDS BV
4 patentsUS12393046B2Aug 19, 2025
Metrology systems, coherence scrambler illumination sources and methods thereof
ASML NETHERLANDS BV1 citations62
US12298257B2May 13, 2025
Monolithic particle inspection device
ASML NETHERLANDS BV1 citations60
US12124173B2Oct 22, 2024
Lithographic apparatus, metrology systems, illumination sources and methods thereof
ASML NETHERLANDS BV0 citations59
US12585198B2Mar 24, 2026
Lithographic apparatus, multi-wavelength phase-modulated scanning metrology system and method
ASML NETHERLANDS BV0 citations50