Inventor

JUNG EUN JI

KR41 patents

⚠️ This page may combine multiple inventors who share the name “JUNG EUN JI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JUNG EUN JI

SAMSUNG ELECTRONICS CO LTD

Method of forming semiconductor device having stacked transistors

Semiconductor device including upper and lower transistors and interconnection between upper and lower transistors

Stacked semiconductor device and method of fabrication

Methods of forming silicide films with metal films in semiconductor devices and contacts including the same

Methods of forming a semiconductor device including buried bit line

Semiconductor devices including buried bit lines

Method of forming semiconductor device having stacked transistors

Methods of forming semiconductor devices having stacked transistors

Semiconductor device

Semiconductor devices

Semiconductor devices and methods of manufacturing the same

Semiconductor devices

Semiconductor devices and methods of manufacturing the same

Semiconductor devices

Semiconductor device having interconnection lines with different linewidths and metal patterns

Methods of forming wiring structures including a plurality of metal layers

Semiconductor device and method of fabricating the same

Methods of forming integrated circuit devices having stacked gate electrodes

Method of fabricating a semiconductor device using a full silicidation process

Semiconductor devices having stacked structures

Methods of forming field effect transistors having metal silicide gate electrodes

Semiconductor device having interconnection lines with different linewidths and metal patterns

Semiconductor device and method for fabricating thereof

Method for forming a silicided gate

Semiconductor devices and methods for manufacturing the same

Semiconductor devices and methods for manufacturing the same

Semiconductor device and method of fabricating the same

Semiconductor device and method of fabricating the same

Semiconductor device and method of fabricating the same

Method of forming relatively continuous silicide layers for semiconductor devices

Method of forming semiconductor device having stacked transistors

Methods of forming self-aligned silicide layers using multiple thermal processes

Semiconductor device and method for manufacturing the same

Method forming ohmic contact layer and metal wiring in semiconductor device

Methods for forming silicide conductors using substrate masking

Methods of forming metal silicide layers by annealing metal layers using inert heat transferring gases established in a convection apparatus

JUNG EUN-JI

Method of forming buried gate electrode utilizing formation of conformal gate oxide and gate electrode layers

Method of forming a metal layer and a method of fabricating a semiconductor device

LG HOUSEHOLD & HEALTH CARE LTD

Cosmetic composition for sustaining luster

SOHN WOONG-HEE

Semiconductor device and method of manufacturing the same

RHIM JUNG A

Simultaneous accomplishment for filtration and washing at pore controllable fiber filter