Inventor

SRIRAMAN SARAVANAPRIYAN

US35 patents

⚠️ This page may combine multiple inventors who share the name “SRIRAMAN SARAVANAPRIYAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SRIRAMAN SARAVANAPRIYAN

LAM RES CORP

Method and apparatus for controlling substrate DC-bias and ion energy and angular distribution during substrate etching

Multi-step method for etching strain gate recesses

Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework

Layout pattern proximity correction through fast edge placement error prediction

Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization

Layout pattern proximity correction through edge placement error prediction

Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework

Methods and apparatuses for etch profile matching by surface kinetic model optimization

Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization

Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization

Method of etch model calibration using optical scatterometry

Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment

Fast-gas switching for etching

Ceramic showerhead including central gas injector for tunable convective-diffusive gas flow in semiconductor substrate processing apparatus

Near-substrate supplemental plasma density generation with low bias voltage within inductively coupled plasma processing chamber

Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity

Air cooled faraday shield and methods for using the same

Method of etch model calibration using optical scatterometry

Method of etch model calibration using optical scatterometry

Extreme edge sheath and wafer profile tuning through edge-localized ion trajectory control and plasma operation

Internal plasma grid for semiconductor fabrication

Fast-gas switching for etching

Semiconductor substrate bevel cleaning

Systems for cooling RF heated chamber components

Air cooled faraday shield and methods for using the same

Resist and etch modeling

Systems for cooling RF heated chamber components

Control of on-wafer cd uniformity with movable edge ring and gas injection adjustment

Systems for cooling RF heated chamber components

Air cooled faraday shield and methods for using the same

Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity

Fast-gas switching for etching

Multi-zone cooling of plasma heated window

Performance predictors for semiconductor-manufacturing processes

MCCHESNEY JON

Systems for cooling RF heated chamber components