Inventor

PATERSON ALEX

US104 patents

⚠️ This page may combine multiple inventors who share the name “PATERSON ALEX”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PATERSON ALEX

LAM RES CORP

Systems and methods for reverse pulsing

Systems and methods for reverse pulsing

Transformer coupled capacitive tuning circuit with fast impedance switching for plasma etch chambers

Ion beam etching system

Matchless plasma source for semiconductor wafer fabrication

Front opening ring pod

Gas distribution showerhead for inductively coupled plasma etch reactor

Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework

TCCT match circuit for plasma etch chambers

Automated replacement of consumable parts using end effectors interfacing with plasma processing system

Front opening ring pod

Automated replacement of consumable parts using interfacing chambers

Front opening ring pod

Ion beam etching system

Matchless plasma source for semiconductor wafer fabrication

Multi-level parameter and frequency pulsing with a low angular spread

Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization

Internal plasma grid for semiconductor fabrication

Matchless plasma source for semiconductor wafer fabrication

Matchless plasma source for semiconductor wafer fabrication

RF voltage sensor incorporating multiple voltage dividers for detecting RF voltages at a pickup device of a substrate support

Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework

Multi-level parameter and frequency pulsing with a low angular spread

Methods and apparatuses for etch profile matching by surface kinetic model optimization

Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization

Multi-level pulsing of DC and RF signals

Internal plasma grid for semiconductor fabrication

Controlling ion energy within a plasma chamber

Large dynamic range RF voltage sensor and method for voltage mode RF bias application of plasma processing systems

Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization

Controlling ion energy within a plasma chamber

Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment

Moveable edge coupling ring for edge process control during semiconductor wafer processing

Internal plasma grid applications for semiconductor fabrication

Internal plasma grid applications for semiconductor fabrication in context of ion-ion plasma processing

RF pulsing within pulsing for semiconductor RF plasma processing

Moveable edge coupling ring for edge process control during semiconductor wafer processing

Multi-level parameter and frequency pulsing with a low angular spread

RF pulsing within pulsing for semiconductor RF plasma processing

Systems and methods for achieving peak ion energy enhancement with a low angular spread

Radiofrequency (RF) filter for multi-frequency RF bias

Systems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrate

KANG MICHAEL

Gas distribution showerhead for inductively coupled plasma etch reactor

Gas distribution system for ceramic showerhead of plasma etch reactor

APPLIED MATERIALS INC

Plasma generation and control using a dual frequency RF source

Method for providing pulsed plasma during a portion of a semiconductor wafer process

LONG MAOLIN

Powered grid for plasma chamber

Faraday shield having plasma density decoupling structure between TCP coil zones

(unassigned)

Method and apparatus to monitor electrical states at a workpiece in a semiconductor processing chamber

MCCHESNEY JON

Systems for cooling RF heated chamber components