Inventor
GUTMAN NADAV
IL31 patents
⚠️ This page may combine multiple inventors who share the name “GUTMAN NADAV”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
16 patentsUS10473460B2Nov 12, 2019
Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals
KLA TENCOR CORP20 citations91
US11085754B2Aug 10, 2021
Enhancing metrology target information content
KLA TENCOR CORP2 citations73
US9841689B1Dec 12, 2017
Approach for model calibration used for focus and dose measurement
KLA TENCOR CORP2 citations73
US10533848B2Jan 14, 2020
Metrology and control of overlay and edge placement errors
KLA TENCOR CORP5 citations72
US10684563B2Jun 16, 2020
On the fly target acquisition
KLA TENCOR CORP3 citations71
US10474040B2Nov 12, 2019
Systems and methods for device-correlated overlay metrology
KLA TENCOR CORP4 citations71
US10622238B2Apr 14, 2020
Overlay measurement using phase and amplitude modeling
KLA TENCOR CORP4 citations70
US9934353B2Apr 3, 2018
Focus measurements using scatterometry metrology
KLA TENCOR CORP5 citations69
US10897566B2Jan 19, 2021
Direct focusing with image binning in metrology tools
KLA TENCOR CORP3 citations67
US11075126B2Jul 27, 2021
Misregistration measurements using combined optical and electron beam technology
KLA TENCOR CORP0 citations62
US10768533B2Sep 8, 2020
Method and system for generating programmed defects for use in metrology measurements
KLA TENCOR CORP1 citations62
US10197922B2Feb 5, 2019
Focus metrology and targets which utilize transformations based on aerial images of the targets
KLA TENCOR CORP1 citations60
US10866090B2Dec 15, 2020
Estimating amplitude and phase asymmetry in imaging technology for achieving high accuracy in overlay metrology
KLA TENCOR CORP0 citations51
US10504802B2Dec 10, 2019
Target location in semiconductor manufacturing
KLA TENCOR CORP0 citations46
US10565697B2Feb 18, 2020
Utilizing overlay misregistration error estimations in imaging overlay metrology
KLA TENCOR CORP0 citations37
US10379449B2Aug 13, 2019
Identifying process variations during product manufacture
KLA TENCOR CORP0 citations36
KLA CORP
15 patentsUS11698251B2Jul 11, 2023
Methods and systems for overlay measurement based on soft X-ray Scatterometry
KLA CORP2 citations73
US11409205B2Aug 9, 2022
Non-orthogonal target and method for using the same in measuring misregistration of semiconductor devices
KLA CORP2 citations72
US11353321B2Jun 7, 2022
Metrology system and method for measuring diagonal diffraction-based overlay targets
KLA CORP2 citations72
US11862524B2Jan 2, 2024
Overlay mark design for electron beam overlay
KLA CORP2 citations71
US12001148B2Jun 4, 2024
Enhancing performance of overlay metrology
KLA CORP2 citations70
US11209737B1Dec 28, 2021
Performance optimized scanning sequence for eBeam metrology and inspection
KLA CORP5 citations69
US12055859B2Aug 6, 2024
Overlay mark design for electron beam overlay
KLA CORP0 citations60
US12535744B2Jan 27, 2026
Overlay estimation based on optical inspection and machine learning
KLA CORP0 citations59
US11592755B2Feb 28, 2023
Enhancing performance of overlay metrology
KLA CORP1 citations59
US11703767B2Jul 18, 2023
Overlay mark design for electron beam overlay
KLA CORP0 citations58
US12100574B2Sep 24, 2024
Target and algorithm to measure overlay by modeling back scattering electrons on overlapping structures
KLA CORP1 citations54
US12092966B2Sep 17, 2024
Device feature specific edge placement error (EPE)
KLA CORP0 citations52
US11720031B2Aug 8, 2023
Overlay design for electron beam and scatterometry overlay measurements
KLA CORP0 citations50
US11637030B2Apr 25, 2023
Multi-stage, multi-zone substrate positioning systems
KLA CORP0 citations49
US12423803B2Sep 23, 2025
Predicting tool induced shift using Moiré overlay targets
KLA CORP0 citations45