Inventor

HORI MASARU

JP56 patents

⚠️ This page may combine multiple inventors who share the name “HORI MASARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HORI MASARU

ASM IP HOLDING BV

Method of reforming insulating film deposited on substrate with recess pattern

Method of cyclic dry etching using etchant film

Method of atomic layer etching using hydrogen plasma

Selective cyclic dry etching process of dielectric materials using plasma modification

Pre-cleaning for etching of dielectric materials

Etching processes and processing assemblies

Methods and systems for topography-selective depositions

Methods for filling a gap and related systems and devices

HORI MASARU

Pattern forming method and semiconductor device manufacturing method

Sample substrate for laser desorption ionization-mass spectrometry, and method and device both using the same for laser desorption ionization-mass spectrometry

Reactive-species supply device and surface treatment apparatus

Reactive-species supply device and surface treatment apparatus

Plasma generator

Multi-micro hollow cathode light source and atomic absorption sepctrometer

Radical generator and molecular beam epitaxy apparatus

Fuel cell structure and method of manufacturing same

TOKYO ELECTRON LTD

Dry etching method

Dry etching method

Plasma deposition apparatus and method with controller

Method of repairing damaged film having low dielectric constant, semiconductor device fabricating system and storage medium

Plasma processing method and plasma processing apparatus

Carbon hard mask, film forming apparatus, and film forming method

Microwave waveguide apparatus, plasma processing apparatus and plasma processing method

TOSHIBA KK

Method of manufacturing semiconductor device

Method of manufacturing an x-ray exposure mask and device for controlling the internal stress of thin films

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device

HITACHI HIGH TECH CORP

Etching method and etching apparatus

Etching method

Etching method

Etching method and etching apparatus

Etching method and etching apparatus

NU ECO ENGINEERING CO LTD

Method for producing graphene

Spectroscopy method and spectroscope

Spectroscopy method and spectroscope

Atomic analyzer

UNIV NAGOYA NAT UNIV CORP

Plasma oxidation processing method

Radical generator and molecular beam epitaxy apparatus

UNIV NAGOYA

Method of manufacturing thin film and method for performing precise working by radical control and apparatus for carrying out such methods

YOSHIDA SATOSHI

Negative electrode for lithium secondary battery, method for preparing the negative electrode, lithium secondary battery having the negative electrode, and vehicle having the lithium secondary battery

GOTO TOSHIO

Plasma source and plasma processing apparatus

ITOH HITOSHI

Plasma generating apparatus, plasma processing apparatus and plasma processing method

NATIONAL UNIV CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM

Carbon nanosheet and manufacturing method therefor

NISSAN CHEMICAL CORP

Method for manufacturing semiconductor substrate having group-III nitride compound layer

DENSO CORP

Method for manufacturing semiconductor device having trench

JO HACEK OVER Z EF STEFAN INST

Carbon nanostructured materials and methods for forming carbon nanostructured materials

TOYOTA MOTOR CO LTD

Fuel cell separator with a vapor-phase grown carbon-based porous material of nanosize structure

SHOWA DENKO KK

Radical generating method, etching method and apparatus for use in these methods

IWATA YOSHIYUKI

Method for manufacturing printed wiring board