Inventor

OKANO HARUO

JP91 patents

⚠️ This page may combine multiple inventors who share the name “OKANO HARUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

OKANO HARUO

TOSHIBA KK

Method of manufacturing semiconductor devices

Method of manufacturing semiconductor device

Method of oxide etching with condensed plasma reaction product

Method for forming a film on a substrate by activating a reactive gas

Polishing method and polishing apparatus

Semiconductor device having a metal film formed in a groove in an insulating film

Polishing method and polishing apparatus

Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field

Method for forming a film on a substrate by activating a reactive gas

Method for forming a film on a substrate by activating a reactive gas

Method of repairing defect of structure

Method of manufacturing silicon oxide film containing fluorine

Method for production of semiconductor device

Method for production of semiconductor device

Polishing apparatus and method for planarizing layer on a semiconductor wafer

Polishing apparatus and method for planarizing layer on a semiconductor wafer

Method of manufacturing semiconductor device

Plasma generating apparatus and surface processing apparatus

Method of manufacturing semiconductor device

Method of making semiconductor integrated-circuit capacitor

Focused ion beam deposition using TMCTS

Semiconductor planarizing apparatus

Method for forming an electrode and/or wiring layer by reducing copper oxide or silver oxide

Charged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus

Method for planarizing a semiconductor device having a amorphous layer

Method of manufacturing semiconductor device

Semiconductor integrated-circuit capacitor having a carbon film electrode

Method for making aluminum single crystal interconnections on insulators

Method of cleaning a charged beam apparatus

Dry etching method

Method for removing composite attached to material by dry etching

Method of manufacturing semiconductor devices including rounding of corner portions by etching

Method of manufacturing semiconductor device

Method of manufacturing a multilayered metallization structure in which the conductive layer and insulating layer are selectively deposited

Dry etching apparatus

Method of selectively forming an insulation layer

Dry etching apparatus and method using reactive gases

Semiconductor device manufacturing method, manufacturing apparatus, simulation method and simulator

Semiconductor device and its fabricating method

Semiconductor device and its fabricating method

Semiconductor device with monocrystalline gate insulating film

Method of manufacturing semiconductor device

TOKYO ELECTRON LTD

Support table for plate-like body and processing apparatus using the table

Magnetron plasma processing apparatus and processing method

Dry etching method

Dry etching method

Apparatus for forming reduced pressure and for processing object

TOKYO SHIBAURA ELECTRIC CO

Dry Etching method and device therefor

RIE Apparatus utilizing a shielded magnetron to enhance etching

APPLIED MATERIALS INC

Inductive RF plasma reactor with overhead coil and conductive laminated RF window beneath the overhead coil