Inventor
KATO KOREHITO
JP14 patents
Patents
14 patentsUS10287499B2May 14, 2019
Etching gas composition for silicon compound, and etching method
KANTO DENKA KOGYO KK2 citations71
US11814561B2Nov 14, 2023
Dry etching gas composition comprising sulfur-containing fluorocarbon compound having unsaturated bond and dry etching method using the same
KANTO DENKA KOGYO KK0 citations61
US11795396B2Oct 24, 2023
Dry etching gas composition comprising sulfur-containing fluorocarbon compound having unsaturated bond and dry etching method using the same
KANTO DENKA KOGYO KK0 citations61
US11434565B2Sep 6, 2022
Cleaning method of semiconductor manufacturing device
KANTO DENKA KOGYO KK1 citations60
US11814726B2Nov 14, 2023
Dry etching method or dry cleaning method
KANTO DENKA KOGYO KK0 citations59
US11584989B2Feb 21, 2023
Dry etching method or dry cleaning method
KANTO DENKA KOGYO KK1 citations59
US11437244B2Sep 6, 2022
Dry etching gas composition and dry etching method
KANTO DENKA KOGYO KK0 citations59
US11183393B2Nov 23, 2021
Atomic layer etching using acid halide
KANTO DENKA KOGYO KK0 citations59
US11315797B2Apr 26, 2022
Plasma etching method using gas molecule containing sulfur atom
KANTO DENKA KOGYO KK1 citations56
US10899615B2Jan 26, 2021
Feeding process of chlorine fluoride
KANTO DENKA KOGYO KK1 citations56
US12410112B2Sep 9, 2025
Purification method for fluoroolefin having structure of =CF2 or =CHF, high-purity fluoroolefin, and production method therefor
KANTO DENKA KOGYO KK0 citations51
US11795397B2Oct 24, 2023
Dry etching gas composition comprising sulfur-containing fluorocarbon compound and dry etching method using the same
KANTO DENKA KOGYO KK0 citations51
US10629449B2Apr 21, 2020
Gas composition for dry etching and dry etching method
KANTO DENKA KOGYO KK0 citations45
US10431472B2Oct 1, 2019
Gas composition for dry etching and dry etching method
KANTO DENKA KOGYO KK0 citations45