Inventor
NAKANO KATSUSHI
JP30 patents
⚠️ This page may combine multiple inventors who share the name “NAKANO KATSUSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
17 patentsUS7388649B2Jun 17, 2008
Exposure apparatus and method for producing device
NIKON CORP121 citations99
US5656769AAug 12, 1997
Scanning probe microscope
NIKON CORP71 citations95
US6223591B1May 1, 2001
Probe needle arrangement and movement method for use in an atomic force microscope
NIKON CORP28 citations92
US6018991AFeb 1, 2000
Scanning probe microscope having cantilever attached to driving member
NIKON CORP25 citations92
US8760617B2Jun 24, 2014
Exposure apparatus and method for producing device
NIKON CORP4 citations84
US8053937B2Nov 8, 2011
Linear motor, stage apparatus and exposure apparatus
NIKON CORP8 citations84
US6635891B1Oct 21, 2003
Hollow-beam apertures for charged-particle-beam microlithography apparatus and methods for making and using same
NIKON CORP13 citations84
US9720332B2Aug 1, 2017
Information calculation method, exposure apparatus, exposure method, device manufacturing method, program, and recording medium
NIKON CORP4 citations82
US8384877B2Feb 26, 2013
Exposure apparatus and method for producing device
NIKON CORP4 citations74
US6802986B2Oct 12, 2004
Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors
NIKON CORP7 citations74
US5784401AJul 21, 1998
Temperature distribution measurement methods and apparatus
NIKON CORP10 citations74
US9746781B2Aug 29, 2017
Exposure apparatus and method for producing device
NIKON CORP2 citations73
US10942457B2Mar 9, 2021
Information calculation method, exposure apparatus, exposure method, device manufacturing method, program, and recording medium
NIKON CORP1 citations71
US10642159B2May 5, 2020
Information calculation method, exposure apparatus, exposure method, device manufacturing method, program, and recording medium
NIKON CORP2 citations71
US6566663B1May 20, 2003
Charged-particle-beam optical components and systems including ferrite exhibiting reduced image displacement from temperature fluctuations
NIKON CORP6 citations63
US11360394B2Jun 14, 2022
Information calculation method, exposure apparatus, exposure method, device manufacturing method, program, and recording medium
NIKON CORP0 citations60
US8040489B2Oct 18, 2011
Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid
NIKON CORP3 citations60
NAKANO KATSUSHI
5 patentsUS8111374B2Feb 7, 2012
Analysis method, exposure method, and device manufacturing method
NAKANO KATSUSHI2 citations61
US8941808B2Jan 27, 2015
Immersion lithographic apparatus rinsing outer contour of substrate with immersion space
NAKANO KATSUSHI2 citations58
US8514366B2Aug 20, 2013
Exposure method and apparatus, maintenance method and device manufacturing method
NAKANO KATSUSHI1 citations51
US8305553B2Nov 6, 2012
Exposure apparatus and device manufacturing method
NAKANO KATSUSHI0 citations51
US8294873B2Oct 23, 2012
Exposure method, device manufacturing method, and substrate
NAKANO KATSUSHI0 citations51
KOBAYASHI NAOYUKI
4 patentsUS8174668B2May 8, 2012
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI11 citations92
US8169592B2May 1, 2012
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI4 citations74
US8130363B2Mar 6, 2012
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI4 citations74
US8072576B2Dec 6, 2011
Exposure apparatus and method for producing device
KOBAYASHI NAOYUKI4 citations74