Inventor
TOYODA KAZUYUKI
JP39 patents
⚠️ This page may combine multiple inventors who share the name “TOYODA KAZUYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
30 patentsUS7900580B2Mar 8, 2011
Substrate processing apparatus and reaction container
HITACHI INT ELECTRIC INC27 citations92
US7861668B2Jan 4, 2011
Batch-type remote plasma processing apparatus
HITACHI INT ELECTRIC INC19 citations92
US7779785B2Aug 24, 2010
Production method for semiconductor device and substrate processing apparatus
HITACHI INT ELECTRIC INC21 citations92
US9487863B2Nov 8, 2016
Substrate processing apparatus
HITACHI INT ELECTRIC INC8 citations84
US9431220B1Aug 30, 2016
Substrate processing apparatus and substrate processing system
HITACHI INT ELECTRIC INC10 citations84
US9171734B1Oct 27, 2015
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC8 citations84
US8925562B1Jan 6, 2015
Substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC6 citations84
US8047158B2Nov 1, 2011
Substrate processing apparatus and reaction container
HITACHI INT ELECTRIC INC8 citations84
US8039404B2Oct 18, 2011
Production method for semiconductor device
HITACHI INT ELECTRIC INC9 citations84
US8028652B2Oct 4, 2011
Batch-type remote plasma processing apparatus
HITACHI INT ELECTRIC INC7 citations83
US8020514B2Sep 20, 2011
Batch-type remote plasma processing apparatus
HITACHI INT ELECTRIC INC9 citations83
US9818630B2Nov 14, 2017
Substrate processing apparatus
HITACHI INT ELECTRIC INC3 citations73
US9666494B2May 30, 2017
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC2 citations73
US9508546B2Nov 29, 2016
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC3 citations73
US9163309B2Oct 20, 2015
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC5 citations73
US9070554B2Jun 30, 2015
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC4 citations73
US9064695B1Jun 23, 2015
Substrate processing apparatus, non-transitory computer-readable recording medium and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC5 citations73
US6576063B2Jun 10, 2003
Apparatus and method for use in manufacturing a semiconductor device
HITACHI INT ELECTRIC INC8 citations73
US9039912B2May 26, 2015
Batch-type remote plasma processing apparatus
HITACHI INT ELECTRIC INC3 citations62
US7033937B2Apr 25, 2006
Apparatus and method for use in manufacturing a semiconductor device
HITACHI INT ELECTRIC INC2 citations62
US7958842B2Jun 14, 2011
Substrate processing apparatus
HITACHI INT ELECTRIC INC2 citations60
US11104995B2Aug 31, 2021
Substrate processing apparatus
HITACHI INT ELECTRIC INC0 citations52
US10818476B2Oct 27, 2020
Substrate processing apparatus
HITACHI INT ELECTRIC INC0 citations52
US10224227B2Mar 5, 2019
Method of processing substrate
HITACHI INT ELECTRIC INC0 citations52
US10115583B2Oct 30, 2018
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations52
US9991179B2Jun 5, 2018
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC1 citations52
US9735068B2Aug 15, 2017
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC1 citations52
US9502236B2Nov 22, 2016
Substrate processing apparatus, non-transitory computer-readable recording medium and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations52
US9373499B2Jun 21, 2016
Batch-type remote plasma processing apparatus
HITACHI INT ELECTRIC INC0 citations51
US10032630B1Jul 24, 2018
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations42