Inventor
SETHURAMAN ANANTHA
US10 patents
⚠️ This page may combine multiple inventors who share the name “SETHURAMAN ANANTHA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR TECH CORP
7 patentsUS8010222B2Aug 30, 2011
Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool
KLA TENCOR TECH CORP29 citations96
US6884146B2Apr 26, 2005
Systems and methods for characterizing a polishing process
KLA TENCOR TECH CORP24 citations96
US7332438B2Feb 19, 2008
Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool
KLA TENCOR TECH CORP11 citations92
US7175503B2Feb 13, 2007
Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device
KLA TENCOR TECH CORP11 citations92
US7030018B2Apr 18, 2006
Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool
KLA TENCOR TECH CORP14 citations92
US6935922B2Aug 30, 2005
Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing
KLA TENCOR TECH CORP16 citations92
US7052369B2May 30, 2006
Methods and systems for detecting a presence of blobs on a specimen during a polishing process
KLA TENCOR TECH CORP10 citations82