Inventor
PARK YOUNG-RAE
KR11 patents
⚠️ This page may combine multiple inventors who share the name “PARK YOUNG-RAE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
10 patentsUS6626968B2Sep 30, 2003
Slurry for chemical mechanical polishing process and method of manufacturing semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD53 citations96
US7196010B2Mar 27, 2007
Slurry for chemical mechanical polishing process and method of manufacturing semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD16 citations84
US6585570B2Jul 1, 2003
Method and apparatus for supplying chemical-mechanical polishing slurries
SAMSUNG ELECTRONICS CO LTD15 citations83
US6695684B2Feb 24, 2004
Chemical mechanical polishing apparatus having a cleaner for cleaning a conditioning disc and method of conditioning a polishing pad of the apparatus
SAMSUNG ELECTRONICS CO LTD15 citations82
US6548388B2Apr 15, 2003
Semiconductor device including gate electrode having damascene structure and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD9 citations72
US7244649B2Jul 17, 2007
Method of manufacturing a capacitor having improved capacitance and method of manufacturing a semiconductor device including the capacitor
SAMSUNG ELECTRONICS CO LTD5 citations62
US6858452B2Feb 22, 2005
Method for isolating self-aligned contact pads
SAMSUNG ELECTRONICS CO LTD6 citations62
US6716732B2Apr 6, 2004
Method for fabricating a contact pad of semiconductor device
SAMSUNG ELECTRONICS CO LTD5 citations62
US6498102B2Dec 24, 2002
Method for planarizing a semiconductor device using ceria-based slurry
SAMSUNG ELECTRONICS CO LTD2 citations62
US6518157B2Feb 11, 2003
Methods of planarizing insulating layers on regions having different etching rates
SAMSUNG ELECTRONICS CO LTD3 citations57