P

Inventor

GRZESKOWIAK JODI

US18 patents

Patents

18 patents
US10770479B2Sep 8, 2020

Three-dimensional device and method of forming the same

TOKYO ELECTRON LTD20 citations94
US11682559B2Jun 20, 2023

Method to form narrow slot contacts

TOKYO ELECTRON LTD2 citations73
US11342427B2May 24, 2022

3D directed self-assembly for nanostructures

TOKYO ELECTRON LTD2 citations73
US11264274B2Mar 1, 2022

Reverse contact and silicide process for three-dimensional logic devices

TOKYO ELECTRON LTD5 citations73
US12488989B2Dec 2, 2025

Method to form narrow slot contacts

TOKYO ELECTRON LTD0 citations62
US11450562B2Sep 20, 2022

Method of bottom-up metallization in a recessed feature

TOKYO ELECTRON LTD0 citations62
US11393694B2Jul 19, 2022

Method for planarization of organic films

TOKYO ELECTRON LTD0 citations62
US11201051B2Dec 14, 2021

Method for layer by layer growth of conformal films

TOKYO ELECTRON LTD0 citations62
US12099299B2Sep 24, 2024

Method of patterning a substrate using a sidewall spacer etch mask

TOKYO ELECTRON LTD0 citations61
US11782346B2Oct 10, 2023

Method of patterning a substrate using a sidewall spacer etch mask

TOKYO ELECTRON LTD0 citations61
US11322401B2May 3, 2022

Reverse contact and silicide process for three-dimensional semiconductor devices

TOKYO ELECTRON LTD1 citations60
US11417526B2Aug 16, 2022

Multiple patterning processes

TOKYO ELECTRON LTD0 citations52
US12564027B2Feb 24, 2026

Top-down self-alignment of vias in a semiconductor device for sub-22NM pitch metals

TOKYO ELECTRON LTD0 citations51
US11990334B2May 21, 2024

Method for tuning stress transitions of films on a substrate

TOKYO ELECTRON LTD0 citations51
US11841617B2Dec 12, 2023

Method of forming a narrow trench

TOKYO ELECTRON LTD0 citations51
US11656550B2May 23, 2023

Controlling semiconductor film thickness

TOKYO ELECTRON LTD0 citations51
US11335566B2May 17, 2022

Method for planarization of spin-on and CVD-deposited organic films

TOKYO ELECTRON LTD0 citations51
US12451354B2Oct 21, 2025

Double patterning method of patterning a substrate

TOKYO ELECTRON LTD0 citations48