Inventor
LEE DO-HAING
KR20 patents
⚠️ This page may combine multiple inventors who share the name “LEE DO-HAING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
9 patentsUS7564042B2Jul 21, 2009
Ion beam apparatus having plasma sheath controller
SAMSUNG ELECTRONICS CO LTD18 citations92
US9401359B2Jul 26, 2016
Semiconductor device
SAMSUNG ELECTRONICS CO LTD6 citations83
US7858464B2Dec 28, 2010
Methods of manufacturing non-volatile memory devices having insulating layers treated using neutral beam irradiation
SAMSUNG ELECTRONICS CO LTD7 citations73
US7629589B2Dec 8, 2009
Apparatus and method for controlling ion beam
SAMSUNG ELECTRONICS CO LTD7 citations73
US9293343B2Mar 22, 2016
Method of forming patterns of semiconductor device
SAMSUNG ELECTRONICS CO LTD4 citations71
US10879244B2Dec 29, 2020
Integrated circuit device
SAMSUNG ELECTRONICS CO LTD3 citations70
US11848364B2Dec 19, 2023
Semiconductor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD1 citations60
US11776962B2Oct 3, 2023
Method of manufacturing integrated circuit device
SAMSUNG ELECTRONICS CO LTD0 citations59
US11329044B2May 10, 2022
Integrated circuit device
SAMSUNG ELECTRONICS CO LTD0 citations59
UNIV SUNGKYUNKWAN
5 patentsUS6926799B2Aug 9, 2005
Etching apparatus using neutral beam
UNIV SUNGKYUNKWAN19 citations90
US6933495B1Aug 23, 2005
3-grid neutral beam source used for etching semiconductor device
UNIV SUNGKYUNKWAN14 citations83
US7094702B2Aug 22, 2006
Layer-by-layer etching apparatus using neutral beam and method of etching using the same
UNIV SUNGKYUNKWAN6 citations71
US7060931B2Jun 13, 2006
Neutral beam source having electromagnet used for etching semiconductor device
UNIV SUNGKYUNKWAN7 citations68
US6874443B2Apr 5, 2005
Layer-by-layer etching apparatus using neutral beam and etching method using the same
UNIV SUNGKYUNKWAN5 citations60
LEE DO-HAING
2 patentsUS8450680B2May 28, 2013
Apparatus and method for processing substrate using neutralized beams including applying a voltage to a substrate support
LEE DO-HAING1 citations48
US8089042B2Jan 3, 2012
Apparatus and method for processing substrate using neutralized beams including applying a voltage to a substrate support
LEE DO-HAING0 citations48