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Inventor

JAEGER DANIEL

US26 patents
⚠️ This page may combine multiple inventors who share the name “JAEGER DANIEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GLOBALFOUNDRIES INC

19 patents
US10373875B1Aug 6, 2019

Contacts formed with self-aligned cuts

GLOBALFOUNDRIES INC7 citations84
US10325819B1Jun 18, 2019

Methods, apparatus and system for providing a pre-RMG replacement metal contact for a finFET device

GLOBALFOUNDRIES INC15 citations84
US9761452B1Sep 12, 2017

Devices and methods of forming SADP on SRAM and SAQP on logic

GLOBALFOUNDRIES INC7 citations83
US10269654B1Apr 23, 2019

Methods, apparatus and system for replacement contact for a finFET device

GLOBALFOUNDRIES INC12 citations82
US9711624B1Jul 18, 2017

Methods for direct measurement of pitch-walking in lithographic multiple patterning

GLOBALFOUNDRIES INC2 citations73
US10644156B2May 5, 2020

Methods, apparatus, and system for reducing gate cut gouging and/or gate height loss in semiconductor devices

GLOBALFOUNDRIES INC5 citations72
US10418455B2Sep 17, 2019

Methods, apparatus and system for stringer defect reduction in a trench cut region of a finFET device

GLOBALFOUNDRIES INC2 citations72
US10340142B1Jul 2, 2019

Methods, apparatus and system for self-aligned metal hard masks

GLOBALFOUNDRIES INC3 citations72
US9780002B1Oct 3, 2017

Threshold voltage and well implantation method for semiconductor devices

GLOBALFOUNDRIES INC2 citations72
US10204797B1Feb 12, 2019

Methods, apparatus, and system for reducing step height difference in semiconductor devices

GLOBALFOUNDRIES INC2 citations71
US9589829B1Mar 7, 2017

FinFET device including silicon oxycarbon isolation structure

GLOBALFOUNDRIES INC4 citations71
US10833160B1Nov 10, 2020

Field-effect transistors with self-aligned and non-self-aligned contact openings

GLOBALFOUNDRIES INC3 citations69
US10930549B2Feb 23, 2021

Cap structure

GLOBALFOUNDRIES INC0 citations61
US10522639B2Dec 31, 2019

Methods, apparatus and system for stringer defect reduction in a trench cut region of a finFET device

GLOBALFOUNDRIES INC0 citations51
US10460986B2Oct 29, 2019

Cap structure

GLOBALFOUNDRIES INC0 citations50
US10249616B2Apr 2, 2019

Methods of forming a resistor structure between adjacent transistor gates on an integrated circuit product and the resulting devices

GLOBALFOUNDRIES INC0 citations42
US10388562B2Aug 20, 2019

Composite contact etch stop layer

GLOBALFOUNDRIES INC0 citations41
US10062612B2Aug 28, 2018

Method and system for constructing FINFET devices having a super steep retrograde well

GLOBALFOUNDRIES INC0 citations41
US10755982B1Aug 25, 2020

Methods of forming gate structures for transistor devices on an IC product

GLOBALFOUNDRIES INC0 citations37

GLOBALFOUNDRIES US INC

3 patents

NESTEC SA

2 patents

GIVAUDAN SA

1 patent

SCHAEFFER JAMES K

1 patent