Inventor
DE LEEUWE MARC
US6 patents
⚠️ This page may combine multiple inventors who share the name “DE LEEUWE MARC”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNION CARBIDE CORP
3 patentsTOKYO ELECTRON LTD
2 patentsUS6537916B2Mar 25, 2003
Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process
TOKYO ELECTRON LTD63 citations95
US7064070B2Jun 20, 2006
Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process
TOKYO ELECTRON LTD17 citations83