Inventor
DZIURA THADDEUS GERARD
US21 patents
⚠️ This page may combine multiple inventors who share the name “DZIURA THADDEUS GERARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
14 patentsUS10352695B2Jul 16, 2019
X-ray scatterometry metrology for high aspect ratio structures
KLA TENCOR CORP68 citations97
US10152678B2Dec 11, 2018
System, method and computer program product for combining raw data from multiple metrology tools
KLA TENCOR CORP21 citations94
US10775323B2Sep 15, 2020
Full beam metrology for X-ray scatterometry systems
KLA TENCOR CORP19 citations93
US10727142B2Jul 28, 2020
Process monitoring of deep structures with X-ray scatterometry
KLA TENCOR CORP17 citations93
US9778213B2Oct 3, 2017
Metrology tool with combined XRF and SAXS capabilities
KLA TENCOR CORP39 citations93
US8860937B1Oct 14, 2014
Metrology systems and methods for high aspect ratio and large lateral dimension structures
KLA TENCOR CORP35 citations93
US8879073B2Nov 4, 2014
Optical metrology using targets with field enhancement elements
KLA TENCOR CORP23 citations90
US10502694B2Dec 10, 2019
Methods and apparatus for patterned wafer characterization
KLA TENCOR CORP7 citations84
US9816810B2Nov 14, 2017
Measurement of multiple patterning parameters
KLA TENCOR CORP11 citations84
US9490182B2Nov 8, 2016
Measurement of multiple patterning parameters
KLA TENCOR CORP12 citations84
US9535018B2Jan 3, 2017
Combined x-ray and optical metrology
KLA TENCOR CORP7 citations83
US10612916B2Apr 7, 2020
Measurement of multiple patterning parameters
KLA TENCOR CORP4 citations73
US10151986B2Dec 11, 2018
Signal response metrology based on measurements of proxy structures
KLA TENCOR CORP6 citations73
US9255877B2Feb 9, 2016
Metrology system optimization for parameter tracking
KLA TENCOR CORP6 citations72
KLA CORP
5 patentsUS11313816B2Apr 26, 2022
Full beam metrology for x-ray scatterometry systems
KLA CORP2 citations72
US11145559B2Oct 12, 2021
Process monitoring of deep structures with X-ray scatterometry
KLA CORP4 citations72
US11955391B2Apr 9, 2024
Process monitoring of deep structures with X-ray scatterometry
KLA CORP0 citations62
US12320763B2Jun 3, 2025
Full beam metrology for x-ray scatterometry systems
KLA CORP0 citations61
US12480893B2Nov 25, 2025
Optical and X-ray metrology methods for patterned semiconductor structures with randomness
KLA CORP0 citations43