Inventor
HISAMATSU TORU
JP48 patents
Patents
48 patentsUS11133192B2Sep 28, 2021
Workpiece processing method
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US10553446B2Feb 4, 2020
Method of processing target object
TOKYO ELECTRON LTD2 citations73
US10504745B2Dec 10, 2019
Method for processing target object
TOKYO ELECTRON LTD2 citations73
US10381236B2Aug 13, 2019
Method of processing target object
TOKYO ELECTRON LTD5 citations73
US9607811B2Mar 28, 2017
Workpiece processing method
TOKYO ELECTRON LTD4 citations73
US11244828B2Feb 8, 2022
Method for processing workpiece
TOKYO ELECTRON LTD2 citations71
US9859126B2Jan 2, 2018
Method for processing target object
TOKYO ELECTRON LTD3 citations71
US12537159B2Jan 27, 2026
Etching method, plasma processing apparatus, and processing system
TOKYO ELECTRON LTD0 citations62
US12512330B2Dec 30, 2025
Substrate processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US12476115B2Nov 18, 2025
Method for processing workpiece
TOKYO ELECTRON LTD0 citations62
US12334343B2Jun 17, 2025
Substrate processing method and substrate processing system
TOKYO ELECTRON LTD0 citations62
US12071687B2Aug 27, 2024
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US11955337B2Apr 9, 2024
Substrate processing method and substrate processing system
TOKYO ELECTRON LTD0 citations62
US11594422B2Feb 28, 2023
Film etching method for etching film
TOKYO ELECTRON LTD0 citations62
US11495469B2Nov 8, 2022
Method for processing substrates
TOKYO ELECTRON LTD0 citations62
US11488836B2Nov 1, 2022
Apparatus for substrate processing
TOKYO ELECTRON LTD1 citations62
US11469111B2Oct 11, 2022
Substrate processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US11459655B2Oct 4, 2022
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US11244804B2Feb 8, 2022
Etching method, plasma processing apparatus, and processing system
TOKYO ELECTRON LTD0 citations62
US11139175B2Oct 5, 2021
Method of processing target object
TOKYO ELECTRON LTD1 citations62
US11127598B2Sep 21, 2021
Film etching method for etching film
TOKYO ELECTRON LTD0 citations62
US11114304B2Sep 7, 2021
Substrate processing method
TOKYO ELECTRON LTD0 citations62
US11081360B2Aug 3, 2021
Method for processing workpiece
TOKYO ELECTRON LTD0 citations62
US10886136B2Jan 5, 2021
Method for processing substrates
TOKYO ELECTRON LTD1 citations62
US10233535B2Mar 19, 2019
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD1 citations62
US12482651B2Nov 25, 2025
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US11823903B2Nov 21, 2023
Method for processing workpiece
TOKYO ELECTRON LTD0 citations61
US11557485B2Jan 17, 2023
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US11545355B2Jan 3, 2023
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US11094551B2Aug 17, 2021
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US12300467B2May 13, 2025
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations59
US12074009B2Aug 27, 2024
Apparatus for processing a substrate
TOKYO ELECTRON LTD0 citations59
US11201062B2Dec 14, 2021
Method and apparatus for processing a substrate
TOKYO ELECTRON LTD0 citations59
US12532683B2Jan 20, 2026
Apparatus for substrate processing
TOKYO ELECTRON LTD0 citations52
US11264236B2Mar 1, 2022
Substrate processing method
TOKYO ELECTRON LTD0 citations52
US10777425B2Sep 15, 2020
Method of processing substrate
TOKYO ELECTRON LTD0 citations52
US10777422B2Sep 15, 2020
Method for processing target object
TOKYO ELECTRON LTD0 citations52
US10707100B2Jul 7, 2020
Processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations52
US10559472B2Feb 11, 2020
Workpiece processing method
TOKYO ELECTRON LTD0 citations52
US9911607B2Mar 6, 2018
Method of processing target object
TOKYO ELECTRON LTD1 citations52
US9524876B2Dec 20, 2016
Plasma etching method and plasma etching apparatus
TOKYO ELECTRON LTD1 citations52
US9330935B2May 3, 2016
Plasma etching method and plasma etching apparatus
TOKYO ELECTRON LTD1 citations52
US10916420B2Feb 9, 2021
Processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations51
US10714340B2Jul 14, 2020
Method for processing workpiece
TOKYO ELECTRON LTD0 citations51
US10763123B2Sep 1, 2020
Method for processing workpiece
TOKYO ELECTRON LTD0 citations42
US10504741B2Dec 10, 2019
Semiconductor manufacturing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations41
US9911622B2Mar 6, 2018
Method of processing target object
TOKYO ELECTRON LTD0 citations40
US9721766B2Aug 1, 2017
Method for processing target object
TOKYO ELECTRON LTD0 citations40