Inventor

MATSUURA YURIKO

JP8 patents

⚠️ This page may combine multiple inventors who share the name “MATSUURA YURIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MERCK PATENT GMBH

4 patents

US11914296B2Feb 27, 2024

Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating

MERCK PATENT GMBH0 citations59

US11609498B2Mar 21, 2023

Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating

MERCK PATENT GMBH0 citations59

US11366389B2Jun 21, 2022

Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same

MERCK PATENT GMBH0 citations59

US11450805B2Sep 20, 2022

Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the same

MERCK PATENT GMBH0 citations48

AZ ELECTRONIC MAT LUXEMBOURG SARL

1 patent

US10451974B2Oct 22, 2019

Rinse composition, a method for forming resist patterns and a method for making semiconductor devices

AZ ELECTRONIC MAT LUXEMBOURG SARL1 citations57

WANG XIAOWEI

1 patent

US9298095B2Mar 29, 2016

Rinse solution for lithography and pattern formation method employing the same

WANG XIAOWEI1 citations50

KANG WENBING

1 patent

US8618002B2Dec 31, 2013

Resist pattern formating method

KANG WENBING0 citations41

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L

1 patent

US9494867B2Nov 15, 2016

Rinsing liquid for lithography and pattern forming method using same

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L0 citations32