Inventor
SHIH CHUN-AN
TW20 patents
⚠️ This page may combine multiple inventors who share the name “SHIH CHUN-AN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CHI MEI CORP
19 patentsUS9395627B2Jul 19, 2016
Positive photosensitive resin composition and method for forming pattern by using the same
CHI MEI CORP12 citations81
US9541832B2Jan 10, 2017
Photosensitive resin composition, protective film and element having the same
CHI MEI CORP2 citations71
US8936891B2Jan 20, 2015
Photosensitive polysiloxane composition and uses thereof
CHI MEI CORP2 citations61
US8921024B2Dec 30, 2014
Photosensitive polysiloxane composition and applications thereof
CHI MEI CORP2 citations61
US8828640B2Sep 9, 2014
Photo-curing polysiloxane composition and application thereof
CHI MEI CORP2 citations61
US9389509B2Jul 12, 2016
Photosensitive polysiloxane composition, protecting film and element having the protecting film
CHI MEI CORP2 citations60
US9851638B2Dec 26, 2017
Photosensitive polysiloxane composition and uses thereof
CHI MEI CORP1 citations50
US8349461B2Jan 8, 2013
Photo-curing polysiloxane composition and protective film formed from the same
CHI MEI CORP0 citations50
US9063422B2Jun 23, 2015
Photosensitive resin composition and application of the same
CHI MEI CORP1 citations49
US9063412B2Jun 23, 2015
Photosensitive resin composition and application of the same
CHI MEI CORP1 citations49
US9023589B2May 5, 2015
Photosensitive resin composition and applications thereof
CHI MEI CORP0 citations46
US9422446B2Aug 23, 2016
Photosensitive resin composition, protective film and element having the same
CHI MEI CORP0 citations40
US9063419B2Jun 23, 2015
Photo-curing polysiloxane composition and application thereof
CHI MEI CORP0 citations40
US9507261B2Nov 29, 2016
Photosensitive composition, protective film, and element having the protective film
CHI MEI CORP0 citations39
US9448474B2Sep 20, 2016
Positive photosensitive resin composition and pattern forming method
CHI MEI CORP0 citations39
US9190521B2Nov 17, 2015
Positive photosensitive resin composition and uses thereof
CHI MEI CORP0 citations36
US9188859B2Nov 17, 2015
Positive photosensitive resin composition and method for forming patterns by using the same
CHI MEI CORP0 citations36
US8841050B2Sep 23, 2014
Photosensitive resin composition and applications thereof
CHI MEI CORP0 citations36
US10162260B2Dec 25, 2018
Photosensitive resin composition, protective film, and liquid crystal display element
CHI MEI CORP0 citations33