P

Inventor

PFEIFFER HANS C

23 patents
⚠️ This page may combine multiple inventors who share the name “PFEIFFER HANS C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

21 patents
US5466904ANov 14, 1995

Electron beam lithography system

IBM54 citations96
US4415851ANov 15, 1983

System for contactless testing of multi-layer ceramics

IBM55 citations96
US4376249AMar 8, 1983

Variable axis electron beam projection system

IBM54 citations96
US4213053AJul 15, 1980

Electron beam system with character projection capability

IBM56 citations96
US4417203ANov 22, 1983

System for contactless electrical property testing of multi-layer ceramics

IBM67 citations95
US4243866AJan 6, 1981

Method and apparatus for forming a variable size electron beam

IBM63 citations95
US4818885AApr 4, 1989

Electron beam writing method and system using large range deflection in combination with a continuously moving table

IBM79 citations94
US6069684AMay 30, 2000

Electron beam projection lithography system (EBPS)

IBM42 citations92
US5633507AMay 27, 1997

Electron beam lithography system with low brightness

IBM44 citations92
US5545902AAug 13, 1996

Electron beam lithography system

IBM34 citations92
US4544846AOct 1, 1985

Variable axis immersion lens electron beam projection system

IBM37 citations92
US4843330AJun 27, 1989

Electron beam contactless testing system with grid bias switching

IBM35 citations91
US3984687AOct 5, 1976

Shielded magnetic lens and deflection yoke structure for electron beam column

IBM36 citations90
US4423305ADec 27, 1983

Method and apparatus for controlling alignment of an electron beam of a variable shape

IBM20 citations82
US4859856AAug 22, 1989

Telecentric sub-field deflection with vail

IBM21 citations81
US4945246AJul 31, 1990

Tri-deflection electron beam system

IBM21 citations80
US4251728AFeb 17, 1981

Compensated magnetic deflection coil for electron beam lithography system

IBM17 citations73
US4000440ADec 28, 1976

Method and apparatus for controlling brightness and alignment of a beam of charged particles

IBM12 citations70
US6130432AOct 10, 2000

Particle beam system with dynamic focusing

IBM15 citations67
US6710361B2Mar 23, 2004

Multi-beam hybrid solenoid lens electron beam system

IBM6 citations63
US6633040B1Oct 14, 2003

Solenoid electron beam lenses with high demagnification and low aberrations

IBM1 citations52

NIKON CORP

2 patents