Inventor

ROSENBLUTH ALAN E

80 patents

⚠️ This page may combine multiple inventors who share the name “ROSENBLUTH ALAN E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ROSENBLUTH ALAN E

IBM

Micromechanical display and fabrication method

Micromechanical displays and fabrication method

High performance projection display with two light valves

Printability verification by progressive modeling accuracy

Extending the range of lithographic simulation integrals

Integrated lithographic print and detection model for optical CD

Fast model-based optical proximity correction

Method for forming alignment layer by ion beam surface modification

System and method for printing semiconductor patterns using an optimized illumination and reticle

CCD based confocal filtering for improved accuracy in x-ray proximity alignment

Lithographic process having improved image quality

Optical projection system

Tool to provide integrated circuit masks with accurate dimensional compensation of patterns

Thin film beamsplitter optical element for use in an image-forming lens system

Lithographic process window optimization under complex constraints on edge placement

Ablation mask and use thereof

Tool to provide integrated circuit masks with accurate dimensional compensation of patterns

Tool to provide integrated circuit masks with accurate dimensional compensation of patterns

Source, target and mask optimization by incorporating contour based assessments and integration over process variations

Mask that provides improved focus control using orthogonal edges

Method for optimizing source and mask to control line width roughness and image log slope

Methodology and system for determining numerical errors in pixel-based imaging simulation in designing lithographic masks

Optical proximity correction using progressively smoothed mask shapes

Fast and accurate optical proximity correction engine for incorporating long range flare effects

Renesting interaction map into design for efficient long range calculations

Printing process calibration and correction

Performance in model-based OPC engine utilizing efficient polygon pinning method

Reflective film interface to restore transverse magnetic wave contrast in lithographic processing

Reflective film interface to restore transverse magnetic wave contrast in lithographic processing

Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare

Tool to provide integrated circuit masks with accurate dimensional compensation of patterns

Tool to provide integrated circuit masks with accurate dimensional compensation of patterns

Source-mask optimization for a lithography process

Method to match exposure tools using a programmable illuminator

Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scale

Stability of ion beam generated alignment layers by surface modification

Reflective light valve

Beamsplitter type lens elements with pupil-plane stops for lithographic systems

Source, target and mask optimization by incorporating countour based assessments and integration over process variations

Mask design method, program, and mask design system

GLOBALFOUNDRIES INC

Synthesizing low mask error enhancement factor lithography solutions

Figurative models calibrated to correct errors in process models

BAGHERI SAEED

Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process

Analyzing a patterning process using a model of yield

TIRAPU-AZPIROZ JAIONE

EMF correction model calibration using asymmetry factor data obtained from aerial images or a patterned layer

LIU YING

Fracturing continuous photolithography masks

TIRAPU AZPIROZ JAIONE

Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations

ROSENBLUTH ALAN E

Method for forming arbitrary lithographic wavefronts using standard mask technology

UNIV ROCHESTER

Normal incidence x-ray reflectors and resonant cavities for supporting laser action using the same

LAI KAFAI

Reflective film interface to restore transverse magnetic wave contrast in lithographic processing