Inventor

COLLINS KENNETH S

US224 patents

⚠️ This page may combine multiple inventors who share the name “COLLINS KENNETH S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

COLLINS KENNETH S

APPLIED MATERIALS INC

Symmetric plasma process chamber

Chemical vapor deposition plasma reactor having plural ion shower grids

Semiconductor substrate process using an optically writable carbon-containing mask

Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing

Low temperature CVD process with selected stress of the CVD layer on CMOS devices

Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer

Semiconductor substrate process using a low temperature deposited carbon-containing hard mask

Copper barrier reflow process employing high speed optical annealing

Low temperature plasma deposition process for carbon layer deposition

Chemical vapor deposition plasma process using plural ion shower grids

Chemical vapor deposition plasma process using an ion shower grid

Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing

Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process

Electrostatic chuck having improved gas conduits

High density plasma process chamber

Plasma reactor and processes using RF inductive coupling and scavenger temperature control

Method of processing a wafer within a reaction chamber

High frequency semiconductor wafer processing apparatus and method

Plasma reactor using UHF/VHF and RF triode source, and process

Method for dechucking a workpiece from an electrostatic chuck

High-frequency semiconductor wafer processing apparatus and method

Selectivity for etching an oxide over a nitride

Plasma-enhanced CVD process using TEOS for depositing silicon oxide

Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process

Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process

Process for PECVD of silicon oxide using TEOS decomposition

CVD of silicon oxide using TEOS decomposition and in-situ planarization process

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Distributed electrode array for plasma processing

Semiconductor processing apparatus which is formed from yttrium oxide and zirconium oxide to produce a solid solution ceramic apparatus

Method of plasma load impedance tuning by modulation of an unmatched low power RF generator

Plasma immersion ion implantation reactor having an ion shower grid

Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas

RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor

Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage

Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement

Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage

Plasma immersion ion implantation process

Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage

Externally excited torroidal plasma source with magnetic control of ion distribution

Electrostatic chuck having composite dielectric layer and method of manufacture

Active species control with time-modulated plasma

Externally excited torroidal plasma source with a gas distribution plate

Plasma reactor using inductive RF coupling, and processes

Method for processing substrates using gaseous silicon scavenger

SUN JENNIFER Y

Corrosion-resistant bonding agents for bonding ceramic components which are exposed to plasmas

CRUSE JAMES P

Methods for processing substrates in process systems having shared resources