Inventor
RODERICK CRAIG A
US29 patents
⚠️ This page may combine multiple inventors who share the name “RODERICK CRAIG A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
27 patentsUS5888414AMar 30, 1999
Plasma reactor and processes using RF inductive coupling and scavenger temperature control
APPLIED MATERIALS INC203 citations99
US6518195B1Feb 11, 2003
Plasma reactor using inductive RF coupling, and processes
APPLIED MATERIALS INC162 citations98
US6165311ADec 26, 2000
Inductively coupled RF plasma reactor having an overhead solenoidal antenna
APPLIED MATERIALS INC98 citations98
US6074488AJun 13, 2000
Plasma chamber support having an electrically coupled collar ring
APPLIED MATERIALS INC118 citations98
US6068784AMay 30, 2000
Process used in an RF coupled plasma reactor
APPLIED MATERIALS INC173 citations98
US6043607AMar 28, 2000
Apparatus for exciting a plasma in a semiconductor wafer processing system using a complex RF waveform
APPLIED MATERIALS INC89 citations98
US5556501ASep 17, 1996
Silicon scavenger in an inductively coupled RF plasma reactor
APPLIED MATERIALS INC396 citations98
US5350479ASep 27, 1994
Electrostatic chuck for high power plasma processing
APPLIED MATERIALS INC199 citations98
US5300460AApr 5, 1994
UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers
APPLIED MATERIALS INC109 citations98
US5210466AMay 11, 1993
VHF/UHF reactor system
APPLIED MATERIALS INC124 citations98
US5187454AFeb 16, 1993
Electronically tuned matching network using predictor-corrector control system
APPLIED MATERIALS INC165 citations98
US6545420B1Apr 8, 2003
Plasma reactor using inductive RF coupling, and processes
APPLIED MATERIALS INC135 citations97
US6488807B1Dec 3, 2002
Magnetic confinement in a plasma reactor having an RF bias electrode
APPLIED MATERIALS INC145 citations97
US6251792B1Jun 26, 2001
Plasma etch processes
APPLIED MATERIALS INC122 citations97
US6444085B1Sep 3, 2002
Inductively coupled RF plasma reactor having an antenna adjacent a window electrode
APPLIED MATERIALS INC54 citations96
US6218312B1Apr 17, 2001
Plasma reactor with heated source of a polymer-hardening precursor material
APPLIED MATERIALS INC61 citations96
US5583737ADec 10, 1996
Electrostatic chuck usable in high density plasma
APPLIED MATERIALS INC57 citations96
US6365063B2Apr 2, 2002
Plasma reactor having a dual mode RF power application
APPLIED MATERIALS INC49 citations95
US5574410ANov 12, 1996
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
APPLIED MATERIALS INC66 citations95
US5539609AJul 23, 1996
Electrostatic chuck usable in high density plasma
APPLIED MATERIALS INC60 citations95
US5392018AFeb 21, 1995
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
APPLIED MATERIALS INC70 citations95
US5065118ANov 12, 1991
Electronically tuned VHF/UHF matching network
APPLIED MATERIALS INC29 citations93
US6440866B1Aug 27, 2002
Plasma reactor with heated source of a polymer-hardening precursor material
APPLIED MATERIALS INC22 citations92
US6353206B1Mar 5, 2002
Plasma system with a balanced source
APPLIED MATERIALS INC52 citations92
US6036877AMar 14, 2000
Plasma reactor with heated source of a polymer-hardening precursor material
APPLIED MATERIALS INC30 citations92
US5572170ANov 5, 1996
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
APPLIED MATERIALS INC31 citations92
US5349313ASep 20, 1994
Variable RF power splitter
APPLIED MATERIALS INC53 citations92