Inventor
HISHIRO YOSHIKI
US23 patents
⚠️ This page may combine multiple inventors who share the name “HISHIRO YOSHIKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
14 patentsUS7538036B2May 26, 2009
Methods of forming openings, and methods of forming container capacitors
MICRON TECHNOLOGY INC36 citations92
US7153778B2Dec 26, 2006
Methods of forming openings, and methods of forming container capacitors
MICRON TECHNOLOGY INC34 citations92
US7119025B2Oct 10, 2006
Methods of eliminating pattern collapse on photoresist patterns
MICRON TECHNOLOGY INC11 citations92
US6599683B1Jul 29, 2003
Photoresist developer with reduced resist toppling and method of using same
MICRON TECHNOLOGY INC28 citations92
US7687406B2Mar 30, 2010
Methods of eliminating pattern collapse on photoresist patterns
MICRON TECHNOLOGY INC8 citations84
US6875552B2Apr 5, 2005
Photoresist composition and method of making
MICRON TECHNOLOGY INC6 citations73
US6713404B2Mar 30, 2004
Methods of forming semiconductor constructions
MICRON TECHNOLOGY INC9 citations73
US8956981B2Feb 17, 2015
Methods of eliminating pattern collapse on photoresist patterns
MICRON TECHNOLOGY INC3 citations62
US7846623B2Dec 7, 2010
Resist pattern and reflow technology
MICRON TECHNOLOGY INC2 citations62
US7371509B2May 13, 2008
Resist pattern and reflow technology
MICRON TECHNOLOGY INC3 citations62
US6943432B2Sep 13, 2005
Semiconductor constructions
MICRON TECHNOLOGY INC2 citations62
US6905973B2Jun 14, 2005
Methods of forming semiconductor constructions
MICRON TECHNOLOGY INC1 citations62
US7402379B2Jul 22, 2008
Resist exposure system and method of forming a pattern on a resist
MICRON TECHNOLOGY INC0 citations52
US7169545B2Jan 30, 2007
Resist exposure system and method of forming a pattern on a resist
MICRON TECHNOLOGY INC0 citations52
SUMITOMO CHEMICAL CO
5 patentsUS5876895AMar 2, 1999
Photosensitive resin composition for color filter
SUMITOMO CHEMICAL CO35 citations92
US5731110AMar 24, 1998
Photoresist composition for use in color filters
SUMITOMO CHEMICAL CO21 citations92
US5686585ANov 11, 1997
Azo dyes for use in color filters and method for production of color filters
SUMITOMO CHEMICAL CO10 citations73
US5492790AFeb 20, 1996
Positive photoresist composition containing a dissolution inhibitor and a dye in an organic solvent
SUMITOMO CHEMICAL CO8 citations73
US5478680ADec 26, 1995
Color filter
SUMITOMO CHEMICAL CO17 citations73
HISHIRO YOSHIKI
3 patentsUS8163468B2Apr 24, 2012
Method of reducing photoresist defects during fabrication of a semiconductor device
HISHIRO YOSHIKI6 citations70
US8859195B2Oct 14, 2014
Methods of lithographically patterning a substrate
HISHIRO YOSHIKI1 citations48
US8309297B2Nov 13, 2012
Methods of lithographically patterning a substrate
HISHIRO YOSHIKI0 citations48