Inventor
HUR MINYOUNG
KR8 patents
Patents
8 patentsUS11545341B2Jan 3, 2023
Plasma etching method and semiconductor device fabrication method including the same
SAMSUNG ELECTRONICS CO LTD4 citations71
US11282679B2Mar 22, 2022
Plasma control apparatus and plasma processing system including the same
SAMSUNG ELECTRONICS CO LTD2 citations67
US12210045B2Jan 28, 2025
Impedance measurement jig and method of controlling a substrate-processing apparatus using the jig
SAMSUNG ELECTRONICS CO LTD0 citations60
US11398397B2Jul 26, 2022
Electrostatic chuck and plasma processing apparatus including the same
SAMSUNG ELECTRONICS CO LTD0 citations60
US12020903B2Jun 25, 2024
Plasma etching method and semiconductor device fabrication method including the same
SAMSUNG ELECTRONICS CO LTD0 citations59
US12592366B2Mar 31, 2026
Substrate processing apparatus and substrate processing method using the same
SAMSUNG ELECTRONICS CO LTD0 citations57
US12322577B2Jun 3, 2025
Plasma baffle, substrate processing apparatus including the same, and substrate processing method using the same
SAMSUNG ELECTRONICS CO LTD0 citations57
US12222362B2Feb 11, 2025
Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer
SAMSUNG ELECTRONICS CO LTD0 citations45