Inventor

LANGAN JOHN G

US5 patents

⚠️ This page may combine multiple inventors who share the name “LANGAN JOHN G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

AIR PROD & CHEM

3 patents

US5626775AMay 6, 1997

NOVELLUS SYSTEMS INC

2 patents

US6872323B1Mar 29, 2005

In situ plasma process to remove fluorine residues from the interior surfaces of a CVD reactor

NOVELLUS SYSTEMS INC104 citations96

US7479191B1Jan 20, 2009

Method for endpointing CVD chamber cleans following ultra low-k film treatments

NOVELLUS SYSTEMS INC20 citations87

LANGAN JOHN G

AIR PROD & CHEM

Plasma etch with trifluoroacetic acid and derivatives

Moisture removal and passivation of surfaces

Method for plasma etching or cleaning with diluted NF3

NOVELLUS SYSTEMS INC

In situ plasma process to remove fluorine residues from the interior surfaces of a CVD reactor

Method for endpointing CVD chamber cleans following ultra low-k film treatments