Inventor

MIZUTANI HIDEO

JP66 patents

⚠️ This page may combine multiple inventors who share the name “MIZUTANI HIDEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MIZUTANI HIDEO

NIKON CORP

Alignment apparatus in projection exposure apparatus

Projection exposing apparatus

Exposure apparatus and method for producing device

Exposure apparatus and method for producing device

Exposure apparatus and method for producing device

Position detecting apparatus

Exposure apparatus

Projection exposure apparatus

Surface position detection apparatus

Surface position detection apparatus

Projection exposure apparatus

Scanning exposure apparatus having a scanning device for scanning light beams along the movement direction of a moving mask stage

Double-beam light source apparatus, position detecting apparatus and aligning apparatus

Method of detecting a position and apparatus therefor

Substrate aligning device using interference light generated by two beams irradiating diffraction grating

Cata-dioptric reduction projection optical system

Alignment apparatus

Substrate alignment apparatus using diffracted and reflected radiation beams

Position detection apparatus with adjustable beam and interference fringe positions

Apparatus for detecting the level of an object surface

Projection optical apparatus

Apparatus and method for detecting the position of a surface to be examined, exposure apparatus equipped with the detecting apparatus and method of producing the exposure apparatus, and method of producing devices using the exposure apparatus

Exposure apparatus utilizing surface position detection, method thereof, and semiconductor device production method using the apparatus

Surface position detection apparatus and method

Alignment apparatus and exposure apparatus equipped therewith

Surface position detecting apparatus and method

Apparatus for detecting a focussing position

Aligning device for exposure apparatus

Alignment device having irradiation and detection light correcting optical elements

Alignment apparatus

Adjusting device for an alignment apparatus

Inclination detecting apparatus and method

Adjustable beam and interference fringe position

Device for detecting the levelling of the surface of an object

Projection exposure apparatus and method

Projection exposure apparatus

Exposure apparatus, method of producing the same, and method of producing devices

Exposure apparatus

Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same

Double-beam light source apparatus, position detecting apparatus and aligning apparatus

Variable-magnification telecentric optical system

Exposure apparatus with variable alignment optical system

Double-beam light source apparatus, position detecting apparatus and aligning apparatus

NIPPON KOGAKU KK

Projection exposure apparatus

Surface displacement sensor with opening angle control

Projection optical apparatus

Optical apparatus for the detection of position

Apparatus for measuring optical characteristics of optical systems

(unassigned)

Fast fourier transform processing device, fast fourier transform processing system, and fast fourier transform processing method

KIUCHI TOHRU

Pattern forming device, pattern forming method, and device manufacturing method