Inventor
OTA KAZUYA
JP68 patents
⚠️ This page may combine multiple inventors who share the name “OTA KAZUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
49 patentsUS7177008B2Feb 13, 2007
Exposure apparatus and method
NIKON CORP135 citations99
US6798491B2Sep 28, 2004
Exposure apparatus and an exposure method
NIKON CORP103 citations99
US6590634B1Jul 8, 2003
Exposure apparatus and method
NIKON CORP843 citations99
US6549269B1Apr 15, 2003
Exposure apparatus and an exposure method
NIKON CORP601 citations99
US6400441B1Jun 4, 2002
Projection exposure apparatus and method
NIKON CORP707 citations99
US6359678B1Mar 19, 2002
Exposure apparatus, method for producing the same, and exposure method
NIKON CORP154 citations99
US6341007B1Jan 22, 2002
Exposure apparatus and method
NIKON CORP1,005 citations99
US6153886ANov 28, 2000
Alignment apparatus in projection exposure apparatus
NIKON CORP175 citations99
US6594334B1Jul 15, 2003
Exposure method and exposure apparatus
NIKON CORP75 citations98
US6549270B1Apr 15, 2003
Exposure apparatus, exposure method and method for manufacturing devices
NIKON CORP107 citations98
US5506684AApr 9, 1996
Projection scanning exposure apparatus with synchronous mask/wafer alignment system
NIKON CORP172 citations97
US5489986AFeb 6, 1996
Position detecting apparatus
NIKON CORP119 citations97
US6727980B2Apr 27, 2004
Apparatus and method for pattern exposure and method for adjusting the apparatus
NIKON CORP55 citations96
US6406820B1Jun 18, 2002
Exposure method for a projection optical system
NIKON CORP56 citations96
US6097473AAug 1, 2000
Exposure apparatus and positioning method
NIKON CORP67 citations96
US6061119AMay 9, 2000
Method of measuring image-forming error of projection optical system, method of manufacturing exposure apparatus, and method of manufacturing semiconductor device
NIKON CORP56 citations96
US6018384AJan 25, 2000
Projection exposure system
NIKON CORP43 citations96
US5914774AJun 22, 1999
Projection exposure apparatus with function to measure imaging characteristics of projection optical system
NIKON CORP61 citations96
US5721607AFeb 24, 1998
Alignment method and apparatus
NIKON CORP71 citations96
US5601957AFeb 11, 1997
Micro devices manufacturing method comprising the use of a second pattern overlying an alignment mark to reduce flattening
NIKON CORP43 citations96
US5488230AJan 30, 1996
Double-beam light source apparatus, position detecting apparatus and aligning apparatus
NIKON CORP47 citations96
US5416562AMay 16, 1995
Method of detecting a position and apparatus therefor
NIKON CORP74 citations96
US5347356ASep 13, 1994
Substrate aligning device using interference light generated by two beams irradiating diffraction grating
NIKON CORP71 citations96
US5160849ANov 3, 1992
Diffraction-type displacement detector for alignment of mask and wafer
NIKON CORP81 citations96
US5151750ASep 29, 1992
Alignment apparatus
NIKON CORP88 citations96
US5118953AJun 2, 1992
Substrate alignment apparatus using diffracted and reflected radiation beams
NIKON CORP54 citations96
US5070250ADec 3, 1991
Position detection apparatus with adjustable beam and interference fringe positions
NIKON CORP61 citations96
US6699630B2Mar 2, 2004
Method and apparatus for exposure, and device manufacturing method
NIKON CORP46 citations93
US6485153B2Nov 26, 2002
Exposure apparatus and method
NIKON CORP30 citations93
US6483569B2Nov 19, 2002
Exposure method and exposure apparatus
NIKON CORP18 citations93
US6249336B1Jun 19, 2001
Projection exposure system
NIKON CORP23 citations93
US6236448B1May 22, 2001
Projection exposure system
NIKON CORP22 citations93
US6228544B1May 8, 2001
Exposure method utilizing pre-exposure reduction of substrate temperature
NIKON CORP42 citations93
US6094255AJul 25, 2000
Projection exposure apparatus and method that floats a plate
NIKON CORP22 citations93
US6057908AMay 2, 2000
Exposure condition measurement method
NIKON CORP43 citations93
US5981116ANov 9, 1999
Alignment in a projection exposure method
NIKON CORP23 citations93
US5942357AAug 24, 1999
Method of measuring baseline amount in a projection exposure apparatus
NIKON CORP35 citations93
US5831739ANov 3, 1998
Alignment method
NIKON CORP32 citations93
US5715063AFeb 3, 1998
Projection exposure method
NIKON CORP32 citations93
US5153678AOct 6, 1992
Method of determining regularity of a pattern array to enable positioning of patterns thereof relative to a reference position
NIKON CORP42 citations93
US5978071ANov 2, 1999
Projection exposure apparatus and method in which mask stage is moved to provide alignment with a moving wafer stage
NIKON CORP43 citations92
US5689339ANov 18, 1997
Alignment apparatus
NIKON CORP48 citations92
US5568257AOct 22, 1996
Adjusting device for an alignment apparatus
NIKON CORP24 citations92
US5561606AOct 1, 1996
Method for aligning shot areas on a substrate
NIKON CORP48 citations92
US5477309ADec 19, 1995
Alignment apparatus
NIKON CORP49 citations92
US5171999ADec 15, 1992
Adjustable beam and interference fringe position
NIKON CORP40 citations92
US6645701B1Nov 11, 2003
Exposure method and exposure apparatus
NIKON CORP48 citations91
US5801389ASep 1, 1998
Acousto-optic modulator, position detector using it, and projection exposure apparatus
NIKON CORP26 citations86
US6813002B2Nov 2, 2004
Exposure method and apparatus, method of making exposure apparatus, device and device manufacturing method
NIKON CORP15 citations84
ASAHI CHEMICAL IND
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