P

Inventor

FUKUDA YASUAKI

JP29 patents
⚠️ This page may combine multiple inventors who share the name “FUKUDA YASUAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CANON KK

27 patents
US5153898AOct 6, 1992

X-ray reduction projection exposure system of reflection type

CANON KK158 citations99
US5808312ASep 15, 1998

System and process for inspecting and repairing an original

CANON KK56 citations96
US5433988AJul 18, 1995

Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray

CANON KK80 citations96
US5310603AMay 10, 1994

Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray

CANON KK66 citations96
US5052033ASep 24, 1991

Reflection type mask

CANON KK75 citations96
US5390228AFeb 14, 1995

Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductor devices

CANON KK90 citations95
US5606586AFeb 25, 1997

X-ray exposure method and apparatus and device manufacturing method

CANON KK21 citations93
US5262257ANov 16, 1993

Mask for lithography

CANON KK32 citations93
US5159621AOct 27, 1992

X-ray transmitting window and method of mounting the same

CANON KK22 citations93
US5528654AJun 18, 1996

Multilayer film for X-rays

CANON KK21 citations92
US5469489ANov 21, 1995

Production method of an x-ray mask structure, an x-ray mask structure produced thereby, and a device fabricated by using the x-ray mask structure

CANON KK26 citations92
US5356686AOct 18, 1994

X-ray mask structure

CANON KK22 citations92
US5204887AApr 20, 1993

X-ray microscope

CANON KK49 citations92
US5123036AJun 16, 1992

X-ray exposure apparatus

CANON KK32 citations92
US5751780AMay 12, 1998

X-ray mask structure, preparation thereof and X-ray exposure method

CANON KK7 citations74
US5333167AJul 26, 1994

Mask structure for x-ray exposure and x-ray exposure device and method using it

CANON KK11 citations74
US5182763AJan 26, 1993

Reflection device

CANON KK8 citations74
US5101420AMar 31, 1992

X-ray mask support and process for preparation thereof

CANON KK14 citations74
US5042945AAug 27, 1991

Lithographic mask structure and device for positioning the same

CANON KK18 citations74
US5012500AApr 30, 1991

X-ray mask support member, X-ray mask, and X-ray exposure process using the X-ray mask

CANON KK16 citations74
US5335259AAug 2, 1994

X-ray exposure apparatus

CANON KK13 citations73
US6167111ADec 26, 2000

Exposure apparatus for synchrotron radiation lithography

CANON KK5 citations63
US5656398AAug 12, 1997

Method of making X-ray mask structure

CANON KK5 citations63
US5607733AMar 4, 1997

Process for preparing an X-ray mask structure

CANON KK4 citations63
US5048066ASep 10, 1991

X-ray exposure process for preventing electrostatic attraction or contact of X-ray masks

CANON KK2 citations63
US6819396B1Nov 16, 2004

Exposure apparatus, and device manufacturing method

CANON KK4 citations62
US5145649ASep 8, 1992

Apparatus for cleaning an optical element for use with a radiation beam

CANON KK2 citations62

FUKUDA YASUAKI

1 patent

SHARP KK

1 patent