Inventor

BARNES MICHAEL S

US62 patents

⚠️ This page may combine multiple inventors who share the name “BARNES MICHAEL S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BARNES MICHAEL S

LAM RES CORP

Method of and apparatus for electronically controlling r.f. energy supplied to a vacuum plasma processor and memory for same

Vacuum plasma processor having coil with minimum magnetic field in its center

Method of and apparatus for igniting a plasma in an r.f. plasma processor

Inductively coupled source for deriving substantially uniform plasma flux

Method of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processor

Method and device for compensating wafer bias in a plasma processing chamber

Plasma device including a powered non-magnetic metal member between a plasma AC excitation source and the plasma

Inductively coupled plasma downstream strip module

Method of in situ cleaning a vacuum plasma processing chamber

Method and apparatus for pressure control in vacuum processors

Vacuum plasma processing wherein workpiece position is detected prior to chuck being activated

Inductively coupled planar source for substantially uniform plasma flux

Vacuum plasma processor having coil with small magnetic field in its center

Apparatus for controlling matching network of a vacuum plasma processor and memory for same

Electrostatic clamping method and apparatus for dielectric workpieces in vacuum processors

Method and apparatus for pressure control in vacuum processors

Method and apparatus for pressure control in vacuum processors

Inductively coupled plasma downstream strip module

IBM

Apparatus for depositing material into high aspect ratio holes

Etching of silicon dioxide selectively to silicon nitride and polysilicon

Electrostatic chuck with reference electrode

Guard ring electrostatic chuck

Optimized helical resonator for plasma processing

Ceramic electrostatic wafer chuck

Plasma wafer processing tool having closed electron cyclotron resonance

Method of making electrostatic chuck with oxide insulator

Electrostatic chuck with reference electrode

Method of making an electrostatic chuck with oxide insulator

Selective fluorocarbon-based RIE process utilizing a nitrogen additive

Guard ring electrostatic chuck

Gettering of particles during plasma processing

Apparatus for gettering of particles during plasma processing

Method of reducing particulates in a plasma tool through steady state flows

BARNES MICHAEL S

Display enclosure with passive cooling system

System and method for dual-sided sputter etch of substrates

System and method for processing substrates with detachable mask

System and method for dual-sided sputter etch of substrates

Combination awning bracket and light support system

Component awning and light support system

APPLIED MATERIALS INC

Externally excited torroidal plasma source with magnetic control of ion distribution

Tandem etch chamber plasma processing system

Adjustable dual frequency voltage dividing plasma reactor

Magnetically enhanced plasma apparatus and method with enhanced plasma uniformity and enhanced ion energy control

INTEVAC INC

System and method for commercial fabrication of patterned media

Apparatus and methods for transporting and processing substrates

BLUCK TERRY

Apparatus and methods for transporting and processing substrates

Apparatus and methods for transporting and processing substrates

(unassigned)

Monitoring substrate processing by detecting reflectively diffracted light

Canopy assembly pivotable by over-height vehicle

UNI STRUCTURES INC

Digital display mounting and lift bracket