Inventor

KELLER JOHN H

US44 patents

⚠️ This page may combine multiple inventors who share the name “KELLER JOHN H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KELLER JOHN H

IBM

Apparatus for depositing material into high aspect ratio holes

Etching of silicon dioxide selectively to silicon nitride and polysilicon

Radio frequency induction/multipole plasma processing tool

Low energy, steered ion beam deposition system having high current at low pressure

High density plasma tool with adjustable uniformity and stochastic electron heating for reduced gas cracking

Apparatus and method of producing a negative ion plasma

Electrostatic chuck with reference electrode

Guard ring electrostatic chuck

Optimized helical resonator for plasma processing

Ceramic electrostatic wafer chuck

Plasma wafer processing tool having closed electron cyclotron resonance

Negative ion extractor for a plasma etching apparatus

Plasma etching reactor with reduced plasma potential

SOI plasma source ion implantation

Extractor and deceleration lens for ion beam deposition apparatus

Method of making electrostatic chuck with oxide insulator

Electrostatic chuck with reference electrode

Plasma amplified photoelectron process endpoint detection apparatus

Multipole implantation-isotope separation ion beam source

Selective fluorocarbon-based RIE process utilizing a nitrogen additive

Modified RIE chamber for uniform silicon etching

Ion implantation apparatus for controlling the surface potential of a target surface

Guard ring electrostatic chuck

Gettering of particles during plasma processing

Apparatus for gettering of particles during plasma processing

Formation of epitaxial layers doped with conductivity-determining impurities by ion deposition

Gettering of particles from an electro-negative plasma with insulating chuck

Method of reducing particulates in a plasma tool through steady state flows

Method and apparatus for reducing particulates in a plasma tool through steady state flows

Multi-function charged particle apparatus

Apparatus for the formation of epitaxial layers doped with conductivity-determining impurities by ion deposition

Apparatus for maintaining ion bombardment beam under improved vacuum condition

Increased ion beam throughput with reduced beam divergence in a dipole magnet

Cold electron plasma reactive ion etching using a rotating electromagnetic filter

Radiation heated acceleration

Gettering of particles from an electro-negative plasma with insulating chuck

KELLER JOHN H

Sailboard step design with less ventilation and increased speed

Planing sailboard

Advances in watercraft hull lift, efficiency, and reduced hump drag with increased stability

K2 KELLER CONSULTING

Planing sailboard

Plasma reactor with high selectivity and reduced damage

UNIV PRINCETON

Reduction of semiconductor structure damage during reactive ion etching

VARIAN SEMICONDUCTOR EQUIPMENT

Extraction and deceleration of low energy beam with low beam divergence

K2 KELLER CONSULTING LLC

Watercraft hull with improved lift, planing speed range, and near maximum efficiency