Inventor
IWAMATSU TOSHIAKI
JP179 patents
⚠️ This page may combine multiple inventors who share the name “IWAMATSU TOSHIAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
41 patentsUS5780888AJul 14, 1998
Semiconductor device with storage node
MITSUBISHI ELECTRIC CORP94 citations99
US5659194AAug 19, 1997
Semiconductor device having metal silicide film
MITSUBISHI ELECTRIC CORP239 citations99
US5656842AAug 12, 1997
Vertical mosfet including a back gate electrode
MITSUBISHI ELECTRIC CORP166 citations99
US5627390AMay 6, 1997
Semiconductor device with columns
MITSUBISHI ELECTRIC CORP200 citations99
US5355022AOct 11, 1994
Stacked-type semiconductor device
MITSUBISHI ELECTRIC CORP347 citations99
US6693324B2Feb 17, 2004
Semiconductor device having a thin film transistor and manufacturing method thereof
MITSUBISHI ELECTRIC CORP118 citations98
US6495898B1Dec 17, 2002
Semiconductor device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP47 citations96
US6455894B1Sep 24, 2002
Semiconductor device, method of manufacturing the same and method of arranging dummy region
MITSUBISHI ELECTRIC CORP72 citations96
US6383860B2May 7, 2002
Semiconductor device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP36 citations96
US6303460B1Oct 16, 2001
Semiconductor device and method for manufacturing the same
MITSUBISHI ELECTRIC CORP54 citations96
US6303425B1Oct 16, 2001
Semiconductor device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP45 citations96
US6215197B1Apr 10, 2001
Semiconductor device having a trench isolation structure and an alignment mark area
MITSUBISHI ELECTRIC CORP61 citations96
US6150688ANov 21, 2000
Semiconductor device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP75 citations96
US6144072ANov 7, 2000
Semiconductor device formed on insulating layer and method of manufacturing the same
MITSUBISHI ELECTRIC CORP68 citations96
US5910672AJun 8, 1999
Semiconductor device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP74 citations96
US5872037AFeb 16, 1999
Method for manufacturing a vertical mosfet including a back gate electrode
MITSUBISHI ELECTRIC CORP62 citations96
US5841171ANov 24, 1998
SOI Semiconductor devices
MITSUBISHI ELECTRIC CORP64 citations96
US5801080ASep 1, 1998
Method of manufacturing semiconductor substrate having total and partial dielectric isolation
MITSUBISHI ELECTRIC CORP29 citations96
US5504376AApr 2, 1996
Stacked-type semiconductor device
MITSUBISHI ELECTRIC CORP84 citations96
US5440161AAug 8, 1995
Semiconductor device having an SOI structure and a manufacturing method thereof
MITSUBISHI ELECTRIC CORP91 citations96
US5736438AApr 7, 1998
Field effect thin-film transistor and method of manufacturing the same as well as semiconductor device provided with the same
MITSUBISHI ELECTRIC CORP46 citations95
US5514880AMay 7, 1996
Field effect thin-film transistor for an SRAM with reduced standby current
MITSUBISHI ELECTRIC CORP56 citations95
US6953979B1Oct 11, 2005
Semiconductor device, method of manufacturing same and method of designing same
MITSUBISHI ELECTRIC CORP20 citations93
US6653656B2Nov 25, 2003
Semiconductor device formed on insulating layer and method of manufacturing the same
MITSUBISHI ELECTRIC CORP13 citations93
US6649976B2Nov 18, 2003
Semiconductor device having metal silicide film and manufacturing method thereof
MITSUBISHI ELECTRIC CORP25 citations93
US6586802B2Jul 1, 2003
Semiconductor device
MITSUBISHI ELECTRIC CORP19 citations93
US6509583B1Jan 21, 2003
Semiconductor device formed on insulating layer and method of manufacturing the same
MITSUBISHI ELECTRIC CORP20 citations93
US6479330B2Nov 12, 2002
Semiconductor device and method for manufacturing the same
MITSUBISHI ELECTRIC CORP22 citations93
US6462428B2Oct 8, 2002
Semiconductor device and method for manufacturing the same
MITSUBISHI ELECTRIC CORP27 citations93
US6426543B1Jul 30, 2002
Semiconductor device including high-frequency circuit with inductor
MITSUBISHI ELECTRIC CORP18 citations93
US6319805B1Nov 20, 2001
Semiconductor device having metal silicide film and manufacturing method thereof
MITSUBISHI ELECTRIC CORP21 citations93
US6258613B1Jul 10, 2001
Control methods of semiconductor manufacturing process, semiconductor manufacturing equipment, and semiconductor manufacturing environment
MITSUBISHI ELECTRIC CORP21 citations93
US6118154ASep 12, 2000
Input/output protection circuit having an SOI structure
MITSUBISHI ELECTRIC CORP33 citations93
US6051494AApr 18, 2000
Semiconductor device having metal silicide film
MITSUBISHI ELECTRIC CORP22 citations93
US6030873AFeb 29, 2000
Semiconductor device with a semiconductor layer formed on an insulating film and manufacturing method thereof
MITSUBISHI ELECTRIC CORP35 citations93
US6025629AFeb 15, 2000
Element isolation structure of a semiconductor device to suppress reduction in threshold voltage of parasitic MOS transistor
MITSUBISHI ELECTRIC CORP20 citations93
US5905286AMay 18, 1999
Semiconductor device
MITSUBISHI ELECTRIC CORP18 citations93
US5719426AFeb 17, 1998
Semiconductor device and manufacturing process thereof
MITSUBISHI ELECTRIC CORP19 citations93
US5652453AJul 29, 1997
Semiconductor device with a semiconductor layer formed on an insulating film and manufacturing method thereof
MITSUBISHI ELECTRIC CORP40 citations93
US5619053AApr 8, 1997
Semiconductor device having an SOI structure
MITSUBISHI ELECTRIC CORP24 citations93
US5381235AJan 10, 1995
Three-dimensional shape measuring device and three-dimensional shape measuring sensor
MITSUBISHI ELECTRIC CORP22 citations93
RENESAS TECH CORP
7 patentsUS7291542B2Nov 6, 2007
Semiconductor wafer and manufacturing method thereof
RENESAS TECH CORP23 citations93
US7067881B2Jun 27, 2006
Semiconductor device
RENESAS TECH CORP29 citations93
US6933565B2Aug 23, 2005
Semiconductor device and method of manufacturing the same
RENESAS TECH CORP39 citations93
US6875663B2Apr 5, 2005
Semiconductor device having a trench isolation and method of fabricating the same
RENESAS TECH CORP29 citations93
US6798021B2Sep 28, 2004
Transistor having a graded active layer and an SOI based capacitor
RENESAS TECH CORP20 citations93
US6794717B2Sep 21, 2004
Semiconductor device and method of manufacturing the same
RENESAS TECH CORP23 citations93
US6774435B1Aug 10, 2004
Semiconductor wafer and semiconductor device comprising gettering layer
RENESAS TECH CORP36 citations93
(unassigned)
1 patentRENESAS ELECTRONICS CORP
1 patentShowing the top 50 of 179 patents by PatentIndex Score.