Inventor
CHANG KYU-HWAN
KR13 patents
⚠️ This page may combine multiple inventors who share the name “CHANG KYU-HWAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
9 patentsUS6513538B2Feb 4, 2003
Method of removing contaminants from integrated circuit substrates using cleaning solutions
SAMSUNG ELECTRONICS CO LTD95 citations96
US5624498AApr 29, 1997
Showerhead for a gas supplying apparatus
SAMSUNG ELECTRONICS CO LTD292 citations96
US6638855B1Oct 28, 2003
Method of filling contact hole of semiconductor device
SAMSUNG ELECTRONICS CO LTD73 citations93
US6162671ADec 19, 2000
Method of forming capacitors having high dielectric constant material
SAMSUNG ELECTRONICS CO LTD25 citations91
US6092539AJul 25, 2000
In-situ cleaning apparatuses for wafers used in integrated circuit devices and methods of cleaning using the same
SAMSUNG ELECTRONICS CO LTD21 citations91
US6607654B2Aug 19, 2003
Copper-plating elecrolyte containing polyvinylpyrrolidone and method for forming a copper interconnect
SAMSUNG ELECTRONICS CO LTD15 citations84
US6335287B1Jan 1, 2002
Method of forming trench isolation regions
SAMSUNG ELECTRONICS CO LTD14 citations83
US6537876B2Mar 25, 2003
Method of manufacturing a semiconductor capacitor having a hemispherical grain layer using a dry cleaning process
SAMSUNG ELECTRONICS CO LTD15 citations82
US6277204B1Aug 21, 2001
Methods for cleaning wafers used in integrated circuit devices
SAMSUNG ELECTRONICS CO LTD14 citations72
SEMES CO LTD
4 patentsUS12237180B2Feb 25, 2025
Apparatus for treating substrate
SEMES CO LTD0 citations52
US12557204B2Feb 17, 2026
Nozzle and substrate treating apparatus including the same
SEMES CO LTD0 citations51
US12412767B2Sep 9, 2025
Apparatus for treating substrate and method for treating substrate
SEMES CO LTD0 citations50
US12489000B2Dec 2, 2025
Apparatus for treating substrate and method for treating substrate
SEMES CO LTD0 citations46