Inventor
LIAN JIN
NL12 patents
Patents
12 patentsUS10788758B2Sep 29, 2020
Method of measuring a parameter of interest, device manufacturing method, metrology apparatus, and lithographic system
ASML NETHERLANDS BV3 citations72
US12276921B2Apr 15, 2025
Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method
ASML NETHERLANDS BV2 citations71
US10444640B2Oct 15, 2019
Metrology apparatus, lithographic system, and method of measuring a structure
ASML NETHERLANDS BV4 citations71
US10831107B2Nov 10, 2020
Method for of measuring a parameter relating to a structure formed using a lithographic process
ASML NETHERLANDS BV3 citations70
US10656534B2May 19, 2020
Method of measuring, device manufacturing method, metrology apparatus, and lithographic system
ASML NETHERLANDS BV2 citations68
US12346031B2Jul 1, 2025
Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method
ASML NETHERLANDS BV0 citations61
US11099489B2Aug 24, 2021
Method of measuring a parameter of a lithographic process, metrology apparatus
ASML NETHERLANDS BV0 citations61
US10310389B2Jun 4, 2019
Method of measuring, device manufacturing method, metrology apparatus, and lithographic system
ASML NETHERLANDS BV1 citations61
US11042100B2Jun 22, 2021
Measurement apparatus and method of measuring a target
ASML NETHERLANDS BV0 citations60
US10908514B2Feb 2, 2021
Metrology apparatus, lithographic system, and method of measuring a structure
ASML NETHERLANDS BV0 citations60
US12326669B2Jun 10, 2025
Illumination apparatus and associated metrology and lithographic apparatuses
ASML NETHERLANDS BV0 citations50
US10705437B2Jul 7, 2020
Metrology method and apparatus, computer program and lithographic system
ASML NETHERLANDS BV0 citations38