Inventor
UEDA YASUHIKO
JP28 patents
⚠️ This page may combine multiple inventors who share the name “UEDA YASUHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MURATA MANUFACTURING CO
11 patentsUS9728343B2Aug 8, 2017
Electrical storage device element and electrical storage device
MURATA MANUFACTURING CO8 citations83
US9748046B2Aug 29, 2017
Power storage device
MURATA MANUFACTURING CO7 citations81
US9558893B2Jan 31, 2017
Power storage device
MURATA MANUFACTURING CO6 citations72
US10163581B2Dec 25, 2018
Laminated power storage device
MURATA MANUFACTURING CO2 citations71
US10163570B2Dec 25, 2018
Power storage device
MURATA MANUFACTURING CO2 citations71
US9793062B2Oct 17, 2017
Electric storage device and method for producing the same
MURATA MANUFACTURING CO2 citations71
US9514893B2Dec 6, 2016
Electrical storage device and method for manufacturing the same
MURATA MANUFACTURING CO3 citations71
US9368776B2Jun 14, 2016
Power storage device and manufacturing method therefor
MURATA MANUFACTURING CO4 citations71
US11289278B2Mar 29, 2022
Power storage device and method of manufacturing the same
MURATA MANUFACTURING CO0 citations61
US10680272B2Jun 9, 2020
Power storage device
MURATA MANUFACTURING CO0 citations40
US10163582B2Dec 25, 2018
Power storage device
MURATA MANUFACTURING CO0 citations40
ELPIDA MEMORY INC
5 patentsUS7696569B2Apr 13, 2010
Semiconductor device including a trench with a curved surface portion and method of manufacturing the same
ELPIDA MEMORY INC19 citations92
US7858508B2Dec 28, 2010
Semiconductor device and method of manufacturing the same
ELPIDA MEMORY INC5 citations63
US7829418B2Nov 9, 2010
Semiconductor apparatus and method for fabricating the same
ELPIDA MEMORY INC2 citations63
US7615460B2Nov 10, 2009
Hard mask technique in forming a plug
ELPIDA MEMORY INC6 citations62
US7589024B2Sep 15, 2009
Process for producing semiconductor integrated circuit device
ELPIDA MEMORY INC6 citations62
NEC ELECTRONICS CORP
4 patentsUS6559486B2May 6, 2003
Etching mask, process for forming contact holes using same, and semiconductor device made by the process
NEC ELECTRONICS CORP15 citations92
US6617245B2Sep 9, 2003
Etching mask, process for forming contact holes using same, and semiconductor device made by the process
NEC ELECTRONICS CORP2 citations62
US6569776B2May 27, 2003
Method of removing silicon nitride film formed on a surface of a material with a process gas containing a higher-order fluorocarbon in combination with a lower-order fluorocarbon
NEC ELECTRONICS CORP6 citations62
US6562721B2May 13, 2003
Dry etching method and method of manufacturing semiconductor device
NEC ELECTRONICS CORP0 citations52
UEDA YASUHIKO
4 patentsUS8637364B2Jan 28, 2014
Semiconductor device and method of manufacturing the same
UEDA YASUHIKO11 citations82
US8513809B2Aug 20, 2013
Semiconductor device
UEDA YASUHIKO10 citations82
US9209193B2Dec 8, 2015
Method of manufacturing device
UEDA YASUHIKO1 citations51
US8877079B2Nov 4, 2014
Method and apparatus for manufacturing a semiconductor device
UEDA YASUHIKO0 citations51
NEC CORP
3 patentsUS6124213ASep 26, 2000
Process of fabricating semiconductor device having ashing step for photo-resist mask in plasma produced from Nx Hy gas
NEC CORP27 citations91
US5810932ASep 22, 1998
Plasma generating apparatus used for fabrication of semiconductor device
NEC CORP18 citations91
US6849539B2Feb 1, 2005
Semiconductor device and method of fabricating the same
NEC CORP6 citations62