P

Inventor

AHMAD AFTAB

US76 patents
⚠️ This page may combine multiple inventors who share the name “AHMAD AFTAB”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MICRON TECHNOLOGY INC

39 patents
US5483175AJan 9, 1996

Method for circuits connection for wafer level burning and testing of individual dies on semiconductor wafer

MICRON TECHNOLOGY INC156 citations99
US5457400AOct 10, 1995

Semiconductor array having built-in test circuit for wafer level testing

MICRON TECHNOLOGY INC194 citations99
US5241266AAug 31, 1993

Built-in test circuit connection for wafer level burnin and testing of individual dies

MICRON TECHNOLOGY INC176 citations99
US5489546AFeb 6, 1996

Method of forming CMOS devices using independent thickness spacers in a split-polysilicon DRAM process

MICRON TECHNOLOGY INC114 citations98
US6373114B1Apr 16, 2002

Barrier in gate stack for improved gate dielectric integrity

MICRON TECHNOLOGY INC76 citations96
US6037639AMar 14, 2000

Fabrication of integrated devices using nitrogen implantation

MICRON TECHNOLOGY INC64 citations96
US5719424AFeb 17, 1998

Graded LDD implant process for sub-half-micron MOS devices

MICRON TECHNOLOGY INC59 citations96
US5716862AFeb 10, 1998

High performance PMOSFET using split-polysilicon CMOS process incorporating advanced stacked capacitior cells for fabricating multi-megabit DRAMS

MICRON TECHNOLOGY INC55 citations96
US5702976ADec 30, 1997

Shallow trench isolation using low dielectric constant insulator

MICRON TECHNOLOGY INC88 citations96
US7071067B1Jul 4, 2006

Fabrication of integrated devices using nitrogen implantation

MICRON TECHNOLOGY INC17 citations93
US6930363B2Aug 16, 2005

Barrier in gate stack for improved gate dielectric integrity

MICRON TECHNOLOGY INC16 citations93
US6770571B2Aug 3, 2004

Barrier in gate stack for improved gate dielectric integrity

MICRON TECHNOLOGY INC15 citations93
US6552394B2Apr 22, 2003

Semiconductor transistor devices and structures with halo regions

MICRON TECHNOLOGY INC15 citations93
US6495885B1Dec 17, 2002

Graded LDD implant process for sub-half-micron MOS devices

MICRON TECHNOLOGY INC17 citations93
US6165827ADec 26, 2000

Semiconductor transistor devices and methods for forming semiconductor transistor devices

MICRON TECHNOLOGY INC20 citations93
US6107145AAug 22, 2000

Method for forming a field effect transistor

MICRON TECHNOLOGY INC19 citations93
US6046472AApr 4, 2000

Graded LDD implant process for sub-half-micron MOS devices

MICRON TECHNOLOGY INC19 citations93
US5849615ADec 15, 1998

Semiconductor processing method of fabricating field effect transistors

MICRON TECHNOLOGY INC24 citations93
US5811329ASep 22, 1998

Method of forming CMOS circuitry including patterning a layer of conductive material overlying field isolation oxide

MICRON TECHNOLOGY INC20 citations93
US5733809AMar 31, 1998

Split-polysilicon CMOS process for multi-megabit dynamic memories incorporating stacked container capacitor cells

MICRON TECHNOLOGY INC23 citations93
US5208176AMay 4, 1993

Method of fabricating an enhanced dynamic random access memory (DRAM) cell capacitor using multiple polysilicon texturization

MICRON TECHNOLOGY INC40 citations93
US6211026B1Apr 3, 2001

Methods of forming integrated circuitry, methods of forming elevated source/drain regions of a field effect transistor, and methods of forming field effect transistors

MICRON TECHNOLOGY INC27 citations92
US6660600B2Dec 9, 2003

Methods of forming integrated circuitry, methods of forming elevated source/drain regions of a field effect transistor, and methods of forming field effect transistors

MICRON TECHNOLOGY INC13 citations83
US6346439B1Feb 12, 2002

Semiconductor transistor devices and methods for forming semiconductor transistor devices

MICRON TECHNOLOGY INC12 citations82
US6159813ADec 12, 2000

Graded LDD implant process for sub-half-micron MOS devices

MICRON TECHNOLOGY INC13 citations82
US5923977AJul 13, 1999

Method of forming CMOS circuitry including patterning a layer of conductive material overlying field isolation oxide

MICRON TECHNOLOGY INC16 citations82
US5830798ANov 3, 1998

Method for forming a field effect transistor

MICRON TECHNOLOGY INC15 citations82
US5668037ASep 16, 1997

Method of forming a resistor and integrated circuitry having a resistor construction

MICRON TECHNOLOGY INC14 citations82
US7176549B2Feb 13, 2007

Shallow trench isolation using low dielectric constant insulator

MICRON TECHNOLOGY INC8 citations74
US6858507B2Feb 22, 2005

Graded LDD implant process for sub-half-micron MOS devices

MICRON TECHNOLOGY INC3 citations74
US6664600B2Dec 16, 2003

Graded LDD implant process for sub-half-micron MOS devices

MICRON TECHNOLOGY INC5 citations74
US6448141B1Sep 10, 2002

Graded LDD implant process for sub-half-micron MOS devices

MICRON TECHNOLOGY INC6 citations74
US6333539B1Dec 25, 2001

Semiconductor transistor devices and methods for forming semiconductor transistor devices

MICRON TECHNOLOGY INC7 citations74
US6319779B1Nov 20, 2001

Semiconductor transistor devices and methods for forming semiconductor transistor devices

MICRON TECHNOLOGY INC10 citations74
US6150204ANov 21, 2000

Semiconductor processing method of fabricating field effect transistors

MICRON TECHNOLOGY INC9 citations74
US6136637AOct 24, 2000

Method of forming CMOS circuitry including patterning conductive material overlying field isolation oxide

MICRON TECHNOLOGY INC5 citations74
US6090685AJul 18, 2000

Method of forming a LOCOS trench isolation structure

MICRON TECHNOLOGY INC9 citations74
US5821150AOct 13, 1998

Method of forming a resistor and integrated circuitry having a resistor construction

MICRON TECHNOLOGY INC6 citations74
US5780920AJul 14, 1998

Method of forming a resistor and integrated circuitry having a resistor construction

MICRON TECHNOLOGY INC5 citations74

MICRON SEMICONDUCTOR INC

4 patents

UNIV KING FAHD PET & MINERALS

4 patents

NEUROWAVE MEDICAL TECHNOLOGIES LLC

1 patent

LSI LOGIC CORP

1 patent

AL-HADHRAMI LUAI M

1 patent

Showing the top 50 of 76 patents by PatentIndex Score.