Inventor
SETOYAMA EIJI
JP13 patents
Patents
13 patentsUS6084356AJul 4, 2000
Plasma processing apparatus with a dielectric body in the waveguide
HITACHI LTD87 citations96
US6196155B1Mar 6, 2001
Plasma processing apparatus and method of cleaning the apparatus
HITACHI LTD65 citations95
US5116482AMay 26, 1992
Film forming system using high frequency power and power supply unit for the same
HITACHI LTD88 citations95
US5429729AJul 4, 1995
Sputtering apparatus, device for exchanging target and method for the same
HITACHI LTD25 citations92
US4986890AJan 22, 1991
Thin film deposition system
HITACHI LTD40 citations92
US4865709ASep 12, 1989
Magnetron sputter apparatus and method for forming films by using the same apparatus
HITACHI LTD38 citations92
US4673482AJun 16, 1987
Sputtering apparatus
HITACHI LTD33 citations92
US5783055AJul 21, 1998
Multi-chamber sputtering apparatus
HITACHI LTD17 citations82
US6224676B1May 1, 2001
Gas supply apparatus and film forming apparatus
HITACHI LTD18 citations80
US5085755AFeb 4, 1992
Sputtering apparatus for forming thin films
HITACHI LTD16 citations72
US4911815AMar 27, 1990
Sputtering apparatus for production of thin films of magnetic materials
HITACHI LTD16 citations70
US5061356AOct 29, 1991
Vacuum treatment apparatus and vacuum treatment method
HITACHI LTD8 citations68
US5376777ADec 27, 1994
Control apparatus and method for a substrate tray on an in-line sputtering apparatus
HITACHI LTD3 citations62