P

Inventor

ROBERTS CEREDIG

US36 patents
⚠️ This page may combine multiple inventors who share the name “ROBERTS CEREDIG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MICRON TECHNOLOGY INC

35 patents
US6204143B1Mar 20, 2001

Method of forming high aspect ratio structures for semiconductor devices

MICRON TECHNOLOGY INC130 citations98
US4987089AJan 22, 1991

BiCMOS process and process for forming bipolar transistors on wafers also containing FETs

MICRON TECHNOLOGY INC152 citations98
US5909630AJun 1, 1999

Dual-masked isolation

MICRON TECHNOLOGY INC54 citations96
US5789306AAug 4, 1998

Dual-masked field isolation

MICRON TECHNOLOGY INC64 citations96
US5573837ANov 12, 1996

Masking layer having narrow isolated spacings and the method for forming said masking layer and the method for forming narrow isolated trenches defined by said masking layer

MICRON TECHNOLOGY INC71 citations96
US5254218AOct 19, 1993

Masking layer having narrow isolated spacings and the method for forming said masking layer and the method for forming narrow isolated trenches defined by said masking layer

MICRON TECHNOLOGY INC85 citations95
US6258729B1Jul 10, 2001

Oxide etching method and structures resulting from same

MICRON TECHNOLOGY INC37 citations93
US6235639B1May 22, 2001

Method of making straight wall containers and the resultant containers

MICRON TECHNOLOGY INC19 citations93
US6103020AAug 15, 2000

Dual-masked field isolation

MICRON TECHNOLOGY INC16 citations93
US5861344AJan 19, 1999

Facet etch for improved step coverage of integrated circuit contacts

MICRON TECHNOLOGY INC36 citations93
US5730835AMar 24, 1998

Facet etch for improved step coverage of integrated circuit contacts

MICRON TECHNOLOGY INC32 citations93
US7687342B2Mar 30, 2010

Method of manufacturing a memory device

MICRON TECHNOLOGY INC22 citations92
US6190989B1Feb 20, 2001

Method for patterning cavities and enhanced cavity shapes for semiconductor devices

MICRON TECHNOLOGY INC32 citations92
US5732023AMar 24, 1998

SRAM cell employing substantially vertically elongated pull-up resistors

MICRON TECHNOLOGY INC23 citations92
US5227321AJul 13, 1993

Method for forming MOS transistors

MICRON TECHNOLOGY INC43 citations89
US6531728B2Mar 11, 2003

Oxide etching method and structures resulting from same

MICRON TECHNOLOGY INC13 citations84
US6822342B2Nov 23, 2004

Raised-lines overlay semiconductor targets and method of making the same

MICRON TECHNOLOGY INC14 citations83
US5985767ANov 16, 1999

Facet etch for improved step coverage of integrated circuit contacts

MICRON TECHNOLOGY INC13 citations82
US5699292ADec 16, 1997

SRAM cell employing substantially vertically elongated pull-up resistors

MICRON TECHNOLOGY INC13 citations82
US6693012B2Feb 17, 2004

Method and device to reduce gate-induced drain leakage (GIDL) current in thin gate oxide MOSFETs

MICRON TECHNOLOGY INC12 citations74
US6271073B1Aug 7, 2001

Method of forming transistors in a peripheral circuit of a semiconductor memory device

MICRON TECHNOLOGY INC6 citations74
US6040209AMar 21, 2000

Semiconductor memory device and method of forming transistors in a peripheral circuit of the semiconductor memory device

MICRON TECHNOLOGY INC8 citations74
US5844835ADec 1, 1998

SCRAM cell employing substantially vertically elongated pull-up resistors

MICRON TECHNOLOGY INC3 citations74
US5844838ADec 1, 1998

SRAM cell employing substantially vertically elongated pull-up resistors

MICRON TECHNOLOGY INC3 citations74
US5751630AMay 12, 1998

SRAM cell employing substantially vertically elongated pull-up resistors

MICRON TECHNOLOGY INC6 citations74
US6914017B1Jul 5, 2005

Residue free overlay target

MICRON TECHNOLOGY INC10 citations73
US7935999B2May 3, 2011

Memory device

MICRON TECHNOLOGY INC2 citations63
US7247919B1Jul 24, 2007

Method and device to reduce gate-induced drain leakage (GIDL) current in thin gate oxides MOSFETs

MICRON TECHNOLOGY INC2 citations63
US6541809B1Apr 1, 2003

Method of making straight wall containers and the resultant containers

MICRON TECHNOLOGY INC3 citations63
US6252268B1Jun 26, 2001

Method of forming transistors in a peripheral circuit of a semiconductor memory device

MICRON TECHNOLOGY INC1 citations63
US5995411ANov 30, 1999

SRAM cell employing substantially vertically elongated pull-up resistors

MICRON TECHNOLOGY INC1 citations63
US5943269AAug 24, 1999

SRAM cell employing substantially vertically elongated pull-up resistors

MICRON TECHNOLOGY INC3 citations63
US5808941ASep 15, 1998

SRAM cell employing substantially vertically elongated pull-up resistors

MICRON TECHNOLOGY INC5 citations63
US7488664B2Feb 10, 2009

Capacitor structure for two-transistor DRAM memory cell and method of forming same

MICRON TECHNOLOGY INC3 citations58
US5969994AOct 19, 1999

Sram cell employing substantially vertically elongated pull-up resistors

MICRON TECHNOLOGY INC0 citations52

PAREKH KUNAL

1 patent