Inventor
LEE SHIHYING
US5 patents
Patents
5 patentsUS6417112B1Jul 9, 2002
Post etch cleaning composition and process for dual damascene system
EKC TECHNOLOGY INC72 citations93
US7135445B2Nov 14, 2006
Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials
EKC TECHNOLOGY INC27 citations88
US7144848B2Dec 5, 2006
Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removal
EKC TECHNOLOGY INC34 citations86
US7157415B2Jan 2, 2007
Post etch cleaning composition for dual damascene system
EKC TECHNOLOGY INC10 citations81
US7479474B2Jan 20, 2009
Reducing oxide loss when using fluoride chemistries to remove post-etch residues in semiconductor processing
EKC TECHNOLOGY INC18 citations79