P

Inventor

MIYAIRI MIWA

JP17 patents

Patents

17 patents
US7323287B2Jan 29, 2008

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD77 citations99
US7074543B2Jul 11, 2006

Positive resist composition and method of forming resist pattern from the same

TOKYO OHKA KOGYO CO LTD151 citations99
US6936400B2Aug 30, 2005

Negative resist composition

TOKYO OHKA KOGYO CO LTD40 citations92
US6406829B1Jun 18, 2002

Negative-working photoresist composition

TOKYO OHKA KOGYO CO LTD44 citations92
US7435530B2Oct 14, 2008

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD5 citations74
US6171749B1Jan 9, 2001

Negative-working chemical-amplification photoresist composition

TOKYO OHKA KOGYO CO LTD12 citations74
US6455228B1Sep 24, 2002

Multilayered body for photolithographic patterning

TOKYO OHKA KOGYO CO LTD13 citations73
US7316888B2Jan 8, 2008

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD2 citations63
US7316885B2Jan 8, 2008

Method of forming resist pattern, positive resist composition, and layered product

TOKYO OHKA KOGYO CO LTD6 citations63
US7316889B2Jan 8, 2008

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD2 citations63
US6544712B1Apr 8, 2003

Negative working resist composition

TOKYO OHKA KOGYO CO LTD5 citations62
US7501221B2Mar 10, 2009

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD0 citations52
US7390612B2Jun 24, 2008

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD0 citations52
US7326515B2Feb 5, 2008

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD0 citations52
US7033731B2Apr 25, 2006

Multilayered body for photolithographic patterning

TOKYO OHKA KOGYO CO LTD0 citations51
US6864036B2Mar 8, 2005

Negative-working photoresist composition

TOKYO OHKA KOGYO CO LTD1 citations51
US7276575B2Oct 2, 2007

Process for refining crude resin for resist

TOKYO OHKA KOGYO CO LTD1 citations49