Inventor

HWANG CHUL-JU

KR20 patents

⚠️ This page may combine multiple inventors who share the name “HWANG CHUL-JU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HWANG CHUL-JU

JUSUNG ENG CO LTD

Atomic layer deposition method and semiconductor device fabricating apparatus having rotatable gas injectors

Gas injector adapted for ALD process

Semiconductor device manufacturing apparatus having rotatable gas injector and thin film deposition method using the same

Atomic layer deposition method

Cluster tool for fabricating semiconductor device

Apparatus for fabricating semiconductor device and method for fabricating semiconductor using the same

High-permittivity dielectric capacitor for a semiconductor device and method for fabricating the same

Semiconductor substrate, semiconductor device and method of manufacturing the same

Method for cleaning wafer surface and a method for forming thin oxide layers

Method of cleaning a semiconductor fabricating apparatus

High vacuum apparatus for fabricating semiconductor device and method for forming epitaxial layer using the same

High density plasma chemical vapor deposition apparatus and gap filling method using the same

Apparatus for fabricating a semiconductor device

(unassigned)

Apparatus for low pressure chemical vapor deposition

Apparatus for low pressure chemical vapor depostion

Apparatus for low pressure chemical vapor deposition

Apparatus for low pressure chemical vapor deposition

JU SUNG ENGINEERING CO LTD

Method for forming a high-permittivity dielectric film use in a semiconductor device

JEIN TECHNICS CO LTD

Apparatus for low pressure chemical vapor deposition

KIM JAE HO

Thin film type solar cell and method for manufacturing the same