P

Inventor

YUAN ZHENG

US83 patents
⚠️ This page may combine multiple inventors who share the name “YUAN ZHENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

20 patents
US7541297B2Jun 2, 2009

Method and system for improving dielectric film quality for void free gap fill

APPLIED MATERIALS INC664 citations99
US7939422B2May 10, 2011

Methods of thin film process

APPLIED MATERIALS INC240 citations98
US7825038B2Nov 2, 2010

Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen

APPLIED MATERIALS INC249 citations98
US6677247B2Jan 13, 2004

Method of increasing the etch selectivity of a contact sidewall to a preclean etchant

APPLIED MATERIALS INC116 citations98
US6793733B2Sep 21, 2004

Gas distribution showerhead

APPLIED MATERIALS INC145 citations97
US7087497B2Aug 8, 2006

Low-thermal-budget gapfill process

APPLIED MATERIALS INC54 citations96
US6624091B2Sep 23, 2003

Methods of forming gap fill and layers formed thereby

APPLIED MATERIALS INC25 citations93
US7208425B2Apr 24, 2007

Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill

APPLIED MATERIALS INC15 citations92
US7033945B2Apr 25, 2006

Gap filling with a composite layer

APPLIED MATERIALS INC43 citations92
US6905940B2Jun 14, 2005

Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill

APPLIED MATERIALS INC30 citations92
US6905939B2Jun 14, 2005

Process for forming silicon oxide material

APPLIED MATERIALS INC28 citations91
US7456116B2Nov 25, 2008

Gap-fill depositions in the formation of silicon containing dielectric materials

APPLIED MATERIALS INC42 citations90
US7674727B2Mar 9, 2010

Nitrous oxide anneal of TEOS/ozone CVD for improved gapfill

APPLIED MATERIALS INC11 citations84
US7141483B2Nov 28, 2006

Nitrous oxide anneal of TEOS/ozone CVD for improved gapfill

APPLIED MATERIALS INC11 citations84
US7642171B2Jan 5, 2010

Multi-step anneal of thin films for film densification and improved gap-fill

APPLIED MATERIALS INC15 citations83
US9649592B2May 16, 2017

Plasma abatement of compounds containing heavy atoms

APPLIED MATERIALS INC11 citations82
US10187966B2Jan 22, 2019

Method and apparatus for gas abatement

APPLIED MATERIALS INC8 citations81
US9711386B2Jul 18, 2017

Electrostatic chuck for high temperature process applications

APPLIED MATERIALS INC5 citations73
US11185815B2Nov 30, 2021

Plasma abatement of compounds containing heavy atoms

APPLIED MATERIALS INC1 citations71
US10449486B2Oct 22, 2019

Plasma abatement of compounds containing heavy atoms

APPLIED MATERIALS INC1 citations71

WEBEX COMMUNICATIONS INC

5 patents

YUAN ZHENG

4 patents

ZOOM VIDEO COMMUNICATIONS INC

4 patents

CISCO TECH INC

3 patents

XIAO SIHAI

2 patents

LU TAORAN

2 patents

ASML US INC

1 patent

WATKINS JOHNSON CO

1 patent

SILICON VALLEY GROUP THERMAL

1 patent

APPLIED MATERIAL INC

1 patent

AGENCY SCIENCE TECH & RES

1 patent

LU DEFENG

1 patent

DING JIANZHONG

1 patent

TIAN YONGJIAN

1 patent

UNIV CHINA PETROLEUM EAST CHINA

1 patent

LIN JIAN

1 patent

Showing the top 50 of 83 patents by PatentIndex Score.