P

Inventor

GHANAYEM STEVE

US16 patents

Patents

16 patents
US6677247B2Jan 13, 2004

Method of increasing the etch selectivity of a contact sidewall to a preclean etchant

APPLIED MATERIALS INC116 citations98
US6309713B1Oct 30, 2001

Deposition of tungsten nitride by plasma enhanced chemical vapor deposition

APPLIED MATERIALS INC89 citations98
US6156382ADec 5, 2000

Chemical vapor deposition process for depositing tungsten

APPLIED MATERIALS INC171 citations97
US5985033ANov 16, 1999

Apparatus and method for delivering a gas

APPLIED MATERIALS INC57 citations96
US6328808B1Dec 11, 2001

Apparatus and method for aligning and controlling edge deposition on a substrate

APPLIED MATERIALS INC44 citations95
US5328722AJul 12, 1994

Metal chemical vapor deposition process using a shadow ring

APPLIED MATERIALS INC149 citations94
US6271129B1Aug 7, 2001

Method for forming a gap filling refractory metal layer having reduced stress

APPLIED MATERIALS INC21 citations92
US6248176B1Jun 19, 2001

Apparatus and method for delivering a gas

APPLIED MATERIALS INC28 citations92
US6186092B1Feb 13, 2001

Apparatus and method for aligning and controlling edge deposition on a substrate

APPLIED MATERIALS INC39 citations92
US7192486B2Mar 20, 2007

Clog-resistant gas delivery system

APPLIED MATERIALS INC15 citations83
US6204174B1Mar 20, 2001

Method for high rate deposition of tungsten

APPLIED MATERIALS INC16 citations81
US6174373B1Jan 16, 2001

Non-plasma halogenated gas flow prevent metal residues

APPLIED MATERIALS INC7 citations74
US6070599AJun 6, 2000

Non-plasma halogenated gas flow to prevent metal residues

APPLIED MATERIALS INC10 citations74
US5709772AJan 20, 1998

Non-plasma halogenated gas flow to prevent metal residues

APPLIED MATERIALS INC2 citations63
US7745309B2Jun 29, 2010

Methods for surface activation by plasma immersion ion implantation process utilized in silicon-on-insulator structure

APPLIED MATERIALS INC5 citations61
US6210483B1Apr 3, 2001

Anti-notch thinning heater

APPLIED MATERIALS INC3 citations57